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Physical Vapor Deposition Systems
Physical Vapor Deposition Systems offer maximum flexibility for a wide range of thin film deposition applications with advanced process capabilities, unsurpassed uniformity and multiple deposition modes.
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Plasma CVD & Reactive Ion Etching System
MODEL DRIE-1100-LL-ECR
The Tek-Vac DRIE-1100-LL-ECR series systems are designed for both high-density plasma chemical vapor deposition and reactive ion etching of sub-micron integrated circuits, optical devices and RF microwave electron devices.
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2 MHz RF Plasma Generators
NOVA® Series
The NOVA ; RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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ICP Plasma System
The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Ozone Gas Generators
SEMOZON® Ozone gas generators and subsystems are the industry standard for compact, high concentration, ultra-clean ozone gas generation. Applications include Atomic Layer Deposition (ALD), Atomic Layer Etch (ALE), Chemical Vapor Deposition (CVD) and Wet Cleaning.
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Ozone Gas Delivery Systems
MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
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Vapor Concentration Monitor
IR-300 Series
Metal-Organic Chemical Vapor Deposition (MOCVD) is widely used in the manufacture of LEDs, optical devices and other components. Liquid and solid precursors are delivered to the reaction chamber by controlling the temperature, pressure and the carrier gas flow rate (bubbling method). Process results can be affected by changes especially in temperature and liquid level. The in-line IR-300 Series measures and reports the precursor concentration in real time.
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Matrix Vapor Deposition System
iMLayer
The iMLayer matrix vapor deposition system is sample pretreatment (application of matrix) in order to perform MALDI-MS imaging using an analysis system such as the iMScope imaging mass microscope or the MALDI-7090. With the iMLayer, the deposition method has been adopted as a pretreatment method to achieve high spatial resolution. By using this method, fine matrix crystal can be produced. Also, thanks to automated control, the coating thickness is reproducibly controlled as users configure.
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Metal-Organic Compound Chemical Vapor Deposition
Model MOCVD-500-A
For Experimental growth of quality epitaxial layers III-V, II-VI compounds. Multi-Layer structures. Directly heated silicon carbide coated, high purity graphite or PBN susceptor. Low mass thermocouple probe immersed into susceptor. Broad temperature and pressure application. Highest quality materials utilized throughout.
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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Liquid Flow Controller
Built upon field proven technology, the Turbo™ Liquid Flow Controller (LFC) 2950 was engineered to pair with MSP Turbo II™ Vaporizers to provide a reliable, high-performance liquid vapor delivery solution for semiconductor thin film deposition processes (including CVD, PECVD, ALD, and MOCVD). The diagram below shows how the LFC fits into the liquid vaporization system MSP offers.
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High Temperature Absolute Pressure Transducers
Our high temperature Baratron® capacitance manometers are controlled to temperatures of 150°C or higher for use use in demanding semiconductor manufacturing vacuum processes such as metal etching and nitride film chemical vapor deposition (CVD).
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Parylene Deposition Equipment
SCS offers Parylene deposition systems that range from a portable laboratory unit to production models for high-volume manufacturing applications. SCS Parylene deposition systems are designed for accurate and repeatable operation, featuring closed-loop monomer pressure control, which ensures deposition of the polymer film at a precise rate. Whether researching new coating applications or developing structures out of Parylene in the laboratory, or coating components in a production environment, SCS leads the industry with its state-of-the-art Parylene deposition systems.
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Particle Deposition Systems
Sets the standards for wafer inspection and metrology equipment. This advanced tool is vital for increasing the yield of future leading-edge devices, while meeting the measurement needs of today.
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Vapor Sorption Analysis
Vapor Sorption Analysis is a technique in which a sample is subjected to varying conditions of humidity and temperature, and the response of the sample is measured gravimetrically. Understanding the effects of water content on structure and properties is critical in the development, processing and end use of a broad spectrum of materials. TA Instruments offers the most sensitive, versatile, and productive moisture sorption analyzers on the market. The Discovery SA combines a high-sensitivity thermobalance, innovative humidity control chamber, and reliable autosampler. Innovative technology combined with our unparalleled reputation for service and support make TA Instruments the clear choice of scientists worldwide for vapor sorption studies.
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Water Vapor Permeability Tester
WPT-304
WPT-304 Water Vapor Permeability Tester is manufactured based on the gravimetric method and is applicable to test the water vapor transmission rate of plastic films, composite films, sheets, and other materials used in packaging, medical and constructive industry.
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Water Vapor Desorption Products
RBD's vacuum chamber water vapor removal products include high-power, high temperature IR radiant bakeout emitters, and low-power, low temperature UVC emitters.
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Water Vapor Permeability Analyzer
Guangzhou Biaoji Packaging Equipment Co., Ltd.
GBPI Water Vapor Permeability Analyzer used to test the water vapor transmission rate (WVTR) of packaging materials, such as plastic film, composite film, coextrusion film, aluminum-plated film, aluminum foil.
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Dynamic Vapor Sorption Analyzer
IGAsorp-CT
The IGAsorp-CT is a fully automated dynamic vapor sorption analyzer for the measurement of water and organic solvent isotherms and kinetics on a wide range of materials. Operating at temperatures from 5 to 85 °C and humidity values from 0 to 98 %RH, the IGAsorp-CT offers the widest combined range of any DVS analyzer. An optional internal heater allows fully programmable pre-heating and thermal desorption measurements to 350 °C.
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Heat, Vapor, and Carbon-Dioxide Flux Sensors
Heat, vapor, and carbon-dioxide flux sensors are typically used in eddy-covariance systems to measure exchanges of carbon dioxide, water vapor, and heat between the surface of the earth and the atmosphere.
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Water Vapor Transmission Rate WVTR Tester
WPT Series
Water Vapor Permeability Tester is based on the Gravimetric method and is applicable to the water vapour transmission rate (WVTR) test of plastic films, composite films, sheets and other materials.
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Water Vapor Permeability Tester
QT-WVP
Qualitest Water Vapor Permeability Tester QT-WVP series is used to test the water vapor transmission rate (WVTR) of packaging materials.
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Vapor Process Gas (VPG) Filters
Filters are an integral piece of your vaporizing system. Conventional high-purity, point-of-use gas filters are used in compressed gas lines for particle removal. MSP’s VPG filters are also uniquely well-suited to be used downstream of a vaporizer under vacuum flow conditions.
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Cold Vapor Atomic Absorption (CVAA) Mercury Analyzer
QuickTrace M‑7600
The QuickTrace® M-7600 Cold Vapor Atomic Absorption (CVAA) Mercury Analyzer easily achieves the ultra-trace mercury detection limit of <0.5 ng/L. The QuickTrace® M-7600 is ideal for ultra-trace to sub-mg/L mercury quantitation. The M-7600 is designed for routine and research use in a variety of settings, including environmental laboratories, industry, and research institutes, for virtually any aqueous acidified sample.
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Vapor Pressure Tester
The MINIVAP laboratory and process vapor pressure analyzers are the worldwide accepted standard instruments for the determination of the vapor pressure of gasoline, crude oil and LPG.
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Reid Vapor Pressure Analyzers
Increase your gasoline blending profits with process Reid Vapor Pressure measurements and automatic air saturation of the sample.
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Dual Vapor Gravimetric Sorption Analyzer
DVS Resolution
DVS Resolution’s key feature is the combined ability to precisely control and measure temperature and relative humidity while recording the highest resolution changes in mass. DVS Resolution uses a dry carrier gas typically nitrogen or compressed air for its operation. Digital mass flow controllers regulate flows of dry and saturated gases. Relative humidity is generated by precisely mixing dry and saturated gas flows in desired flow ratios which produce expected relative humidity. In a typical experiment a known concentration of water vapor is delivered over a sample placed inside the sample pan connected to the Surface Measurement Systems Ultrabalance™ measuring realtime mass changes caused by sorption or desorption of water molecules. Prior to sorption measurements, the sample can be in-situ preheated/dried at temperatures of up to 300oC.
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Water Vapor Absorption Tester
DRK854A
Shandong Drick Instruments Co., Ltd.
Used to test the water vapor absorption performance of the sample.
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Gas and Vapor Delivery Systems
Gas and vapor delivery systems address critical issues facing semiconductor manufacturers and foundries, including material costs, process repeatability and system up-time.
