Vapor Deposition
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Matrix Vapor Deposition System
iMLayer
The iMLayer matrix vapor deposition system is sample pretreatment (application of matrix) in order to perform MALDI-MS imaging using an analysis system such as the iMScope imaging mass microscope or the MALDI-7090. With the iMLayer, the deposition method has been adopted as a pretreatment method to achieve high spatial resolution. By using this method, fine matrix crystal can be produced. Also, thanks to automated control, the coating thickness is reproducibly controlled as users configure.
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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Dynamic Ultra Micro Hardness Tester
DUH-210/DUH-210S
A new evaluation system for measuring the material strength of micro regions, such as semiconductors, LSI, ceramics, hard disks, vapor deposited films, and thin coating layers, not addressed by previous hardness testers. It can also be used to evaluate the hardness of plastics and rubbers. This instrument uniquely measures dynamic indentation depth, not the indentation after the test. This in turn permits measurement of very thin films and surface (treatment) layers that are impossible to measure with conventional methods. Additionally, this same method supplies the data needed to calculate elastic modulus on the test specimens.
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Physical Vapor Deposition Systems
Physical Vapor Deposition (PVD) systems use physical processes, like sputtering and evaporation, to deposit thin films with exceptional purity and control. These techniques are widely used in semiconductor manufacturing, optical coatings and protective applications.
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Ozone Gas Generators
SEMOZON® Ozone gas generators and subsystems are the industry standard for compact, high concentration, ultra-clean ozone gas generation. Applications include Atomic Layer Deposition (ALD), Atomic Layer Etch (ALE), Chemical Vapor Deposition (CVD) and Wet Cleaning.
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High Temperature Absolute Pressure Transducers
Our high temperature Baratron® capacitance manometers are controlled to temperatures of 150°C or higher for use use in demanding semiconductor manufacturing vacuum processes such as metal etching and nitride film chemical vapor deposition (CVD).
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ICP Plasma System
The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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EpiStride SiC CVD System
Veeco’s latest technology for the compound semiconductor market enables high-performance chemical vapor deposition of Silicon Carbide for both 6 and 8-inch wafer production. The platform enables a return to production in under 5 hours after routine cleaning maintenance. The EpiStride system’s high uptimes, short cycle times and overall stable performance lead to the lowest cost of ownership per wafer compared to competitive systems.
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MOCVD Systems
For growing high-quality compound semiconductor films, few techniques match the precision of Metal-Organic Chemical Vapor Deposition (MOCVD). They give engineers tight control over film composition and thickness, making them essential for optoelectronics and advanced power transistors.
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Deposition Systems
When a thin film requires the most stringent structural or compositional properties consistently across every layer, Veeco’s Ion Beam Deposition (IBD) technology is often the answer. Using a focused beam of ions to sputter material from a target, this physical vapor deposition technique builds dense, uniform films with standout adhesion and stability.
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Gas and Vapor Delivery Systems
In thin film deposition, high-quality results start with how process gases are delivered, as they help create the stable environment needed for consistency by controlling flow, pressure and composition to support processes like ALD, CVD, and PVD. Advanced semiconductor devices developed for the most advanced computing processes, such as AI and edge computing, need the ultra-high-purity environments of our gas and vapor deposition delivery systems.
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Ceramic Process Carrier Pallets
Ceramic engineering specializing in Silicon Carbide, Boron Carbide, Alumina, Zirconia and Lead Zirconate Titanate (PZT) based ceramics, composites and thin films for High Strength, high temperature, semiconductive ceramic designed for use in wafer fabrication or hybrid circuits in vapor deposite ovens. Test Electronics will precision drill and customize pallets for your circuit board. Click on the Quote tab on the left then click on the Carrier Pallets tab to get an instant quotation on your process carrier pallets.
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Ozone Gas Delivery Systems
MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
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Vapor Concentration Monitor
IR-300 Series
Metal-Organic Chemical Vapor Deposition (MOCVD) is widely used in the manufacture of LEDs, optical devices and other components. Liquid and solid precursors are delivered to the reaction chamber by controlling the temperature, pressure and the carrier gas flow rate (bubbling method). Process results can be affected by changes especially in temperature and liquid level. The in-line IR-300 Series measures and reports the precursor concentration in real time.
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Vapor Pressure Tester
The MINIVAP laboratory and process vapor pressure analyzers are the worldwide accepted standard instruments for the determination of the vapor pressure of gasoline, crude oil and LPG.
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Dynamic Vapor Sorption Analyzer
IGAsorp
The IGAsorp is a fully automated compact benchtop DVS analyzer, for fast and accurate vapor sorption measurements using the dynamic flow technique for water and organic solvents. Measured vapor uptake isotherms and kinetics are used to characterize, test and evaluate materials in precisely defined environmental conditions.
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Atomic Layer Deposition Systems
Atomic Layer Deposition (ALD) is a powerful way to build ultra-thin, super-precise coatings, one atomic layer at a time. It’s especially useful and efficient when working with tiny, complex 3D structures, making it a go-to technique in advanced semiconductor manufacturing.
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Crude Oil Package for Vapor Pressure
The GRABNER INSTRUMENTS' Crude Oil Package is a comprehensive solution for the transport and measurement of the vapor pressure of crude oil according to ASTM D6377 (Expansion Method). The unique Floating Piston Cylinder allows safe sample transfer of “live crude oils” according to ASTM D3700 and eliminates the risk of evaporation of light hydrocarbon ends during transport. The Grabner Instruments crude oil package is also strictly in accordance with the Russian standard GOST 52340.
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Thin-film deposition
Plasma Source
SPECS Surface Nano Analysis GmbH
Thin-film deposition covers any technique for depositing material onto a bulk or thin film substrate. Elemental alloy or compound films are produced by non-reactive or reactive (co-)deposition. Often functionalization or tailoring of device interfaces by predeposition or deposition assisting surface treatment with atoms or ions is necessary.
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Particle Deposition Systems
MSP’s 2300G3 Particle Deposition System sets the standards for wafer inspection and metrology equipment. This advanced tool is vital for increasing the yield of future leading-edge devices, while meeting the measurement needs of today.
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Water Vapor Absorption Tester
DRK854A
Shandong Drick Instruments Co., Ltd.
Used to test the water vapor absorption performance of the sample.
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Vapor Mass Flow Controllers
Heated pressure-based mass flow controllers are designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas.
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Parylene Deposition Equipment
SCS offers Parylene deposition systems that range from a portable laboratory unit to production models for high-volume manufacturing applications. SCS Parylene deposition systems are designed for accurate and repeatable operation, featuring closed-loop monomer pressure control, which ensures deposition of the polymer film at a precise rate. Whether researching new coating applications or developing structures out of Parylene in the laboratory, or coating components in a production environment, SCS leads the industry with its state-of-the-art Parylene deposition systems.
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Water Vapor Transmission Rate Tester (infrared method)
DRK311
Shandong Drick Instruments Co., Ltd.
DRK311 water vapor transmission rate tester (infrared method), the instrument is suitable for the determination of water vapor transmission rate of plastic films, composite films and other films and sheet materials. Through the measurement of water vapor transmission rate, the technical indicators of control and adjustment of packaging materials and other products can be achieved to meet the different needs of product applications.
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Heat, Vapor, and Carbon-Dioxide Flux Sensors
Heat, vapor, and carbon-dioxide flux sensors are typically used in eddy-covariance systems to measure exchanges of carbon dioxide, water vapor, and heat between the surface of the earth and the atmosphere.
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Internal Vapor Analyzer
IVA® MODEL 210S
The IVA® system is specifically designed for the quantitative analysis of low molecular weight gases contained in hermetic packages, cavities and other enclosures. The Model 210s concept integrates automated hardware with easy-to-use icon-driven software. Its design permits routine quality control, failure analysis and research level testing operation as a turn-key analytical system. The IVA® Model 210s includes a high-performance, quadrupole-mass spectrometer analyzer, a sample-mounting interface and precision hardware. The instrument is also computer-controlled and equipped with exclusive ORS integrated system control software — which provides instrument control, data analysis, data archiving and ease of operation.
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CVAF – Cold Vapor Atomic Fluorescence
Cold Vapor Atomic Fluorescence (CVAF) is a powerful technique based on detecting fluorescence light emitted by the sample. Below the principle of the technique is explained in a nutshell.
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Water Vapor Transmission Rate Tester
(Electrolysis Method)
Shandong Drick Instruments Co., Ltd.
DRK311 water vapor transmission rate tester (electrolytic method), the instrument is suitable for the determination of water vapor transmission rate of plastic films, composite films and other films and sheet materials. Through the measurement of water vapor transmission rate, the technical indicators of control and adjustment of packaging materials and other products can be achieved to meet the different needs of product applications.
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Water Vapor Transmission Rate WVTR Tester
WPT Series
Water Vapor Permeability Tester is based on the Gravimetric method and is applicable to the water vapour transmission rate (WVTR) test of plastic films, composite films, sheets and other materials.
