Vapor Deposition
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Product
Matrix Vapor Deposition System
iMLayer
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The iMLayer matrix vapor deposition system is sample pretreatment (application of matrix) in order to perform MALDI-MS imaging using an analysis system such as the iMScope imaging mass microscope or the MALDI-7090. With the iMLayer, the deposition method has been adopted as a pretreatment method to achieve high spatial resolution. By using this method, fine matrix crystal can be produced. Also, thanks to automated control, the coating thickness is reproducibly controlled as users configure.
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Product
Dynamic Ultra Micro Hardness Tester
DUH-210/DUH-210S
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A new evaluation system for measuring the material strength of micro regions, such as semiconductors, LSI, ceramics, hard disks, vapor deposited films, and thin coating layers, not addressed by previous hardness testers. It can also be used to evaluate the hardness of plastics and rubbers. This instrument uniquely measures dynamic indentation depth, not the indentation after the test. This in turn permits measurement of very thin films and surface (treatment) layers that are impossible to measure with conventional methods. Additionally, this same method supplies the data needed to calculate elastic modulus on the test specimens.
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Gas and Vapor Delivery Systems
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In thin film deposition, high-quality results start with how process gases are delivered, as they help create the stable environment needed for consistency by controlling flow, pressure and composition to support processes like ALD, CVD, and PVD. Advanced semiconductor devices developed for the most advanced computing processes, such as AI and edge computing, need the ultra-high-purity environments of our gas and vapor deposition delivery systems.
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Physical Vapor Deposition Systems
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Physical Vapor Deposition (PVD) systems use physical processes, like sputtering and evaporation, to deposit thin films with exceptional purity and control. These techniques are widely used in semiconductor manufacturing, optical coatings and protective applications.
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Product
EpiStride SiC CVD System
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Veeco’s latest technology for the compound semiconductor market enables high-performance chemical vapor deposition of Silicon Carbide for both 6 and 8-inch wafer production. The platform enables a return to production in under 5 hours after routine cleaning maintenance. The EpiStride system’s high uptimes, short cycle times and overall stable performance lead to the lowest cost of ownership per wafer compared to competitive systems.
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High Temperature Absolute Pressure Transducers
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Our high temperature Baratron® capacitance manometers are controlled to temperatures of 150°C or higher for use use in demanding semiconductor manufacturing vacuum processes such as metal etching and nitride film chemical vapor deposition (CVD).
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MOCVD Systems
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For growing high-quality compound semiconductor films, few techniques match the precision of Metal-Organic Chemical Vapor Deposition (MOCVD). They give engineers tight control over film composition and thickness, making them essential for optoelectronics and advanced power transistors.
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Ceramic Process Carrier Pallets
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Ceramic engineering specializing in Silicon Carbide, Boron Carbide, Alumina, Zirconia and Lead Zirconate Titanate (PZT) based ceramics, composites and thin films for High Strength, high temperature, semiconductive ceramic designed for use in wafer fabrication or hybrid circuits in vapor deposite ovens. Test Electronics will precision drill and customize pallets for your circuit board. Click on the Quote tab on the left then click on the Carrier Pallets tab to get an instant quotation on your process carrier pallets.
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Product
GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
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The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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Product
ICP Plasma System
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The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Vapor Concentration Monitor
IR-300 Series
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Metal-Organic Chemical Vapor Deposition (MOCVD) is widely used in the manufacture of LEDs, optical devices and other components. Liquid and solid precursors are delivered to the reaction chamber by controlling the temperature, pressure and the carrier gas flow rate (bubbling method). Process results can be affected by changes especially in temperature and liquid level. The in-line IR-300 Series measures and reports the precursor concentration in real time.
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Deposition Systems
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When a thin film requires the most stringent structural or compositional properties consistently across every layer, Veeco’s Ion Beam Deposition (IBD) technology is often the answer. Using a focused beam of ions to sputter material from a target, this physical vapor deposition technique builds dense, uniform films with standout adhesion and stability.
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Ozone Gas Generators
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SEMOZON® Ozone gas generators and subsystems are the industry standard for compact, high concentration, ultra-clean ozone gas generation. Applications include Atomic Layer Deposition (ALD), Atomic Layer Etch (ALE), Chemical Vapor Deposition (CVD) and Wet Cleaning.
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Ozone Gas Delivery Systems
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MKS ozone gas delivery systems provide field-proven, high concentration, ultra-clean ozone generation for advanced thin film applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), contaminant removal and oxide growth. Gas delivery models have integrated ozone concentration monitoring, flow control, and power distribution. Additional system options include safety monitoring, status indicators and ozone destruction capability.
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Duct Deposit Measuring System
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The Elcometer 456 Duct Deposit Measuring System has been specifically designed to meet the requirements of the DTT (Deposit Thickness Test) in HVCA’s (Heating & Ventilation Contractor’s Association) Guide to Good Practice, for the measurement of dust and grease deposits within ventilation systems and kitchen ducts made of ferrous metals.
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Vapor Tension Thermometer
RF60A
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UEi Test & Measurement Instruments
Farenheit and Celsius scale Vapor Tension thermometer
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Product
Particle Deposition Systems
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MSP’s 2300G3 Particle Deposition System sets the standards for wafer inspection and metrology equipment. This advanced tool is vital for increasing the yield of future leading-edge devices, while meeting the measurement needs of today.
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Water Vapor Permeability Analyzer
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Guangzhou Biaoji Packaging Equipment Co., Ltd.
GBPI Water Vapor Permeability Analyzer used to test the water vapor transmission rate (WVTR) of packaging materials, such as plastic film, composite film, coextrusion film, aluminum-plated film, aluminum foil.
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Water Vapor Transmission Rate Tester
(Electrolysis Method)
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Shandong Drick Instruments Co., Ltd.
DRK311 water vapor transmission rate tester (electrolytic method), the instrument is suitable for the determination of water vapor transmission rate of plastic films, composite films and other films and sheet materials. Through the measurement of water vapor transmission rate, the technical indicators of control and adjustment of packaging materials and other products can be achieved to meet the different needs of product applications.
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Product
Testing Released Water Vapor
Humiditest™ Complete System
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The James Instruments Humitest System allows the concrete practitioner to monitor and ensure that a new structure is dry enough to proceed with the next phase of construction. This is especially critical for concrete structures requiring a coating, carpeting or similar floor or covering treatment. Installing such treatments before the concrete is sufficiently dry will typically cause expensive failures in the covering treatment. The only accurate way to ensure that the concrete is sufficiently dry enough to safely avoid expensive re-work is via a bore hole humidity test system, such as the Humitest System
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Mixed Injection System Liquid Vaporizers
MI-1000/MV-1000
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This mixed injection system can rapidly vaporize a wide variety of liquid sources by using the gas-liquid mixture vaporization method. This method allows for the stable vaporization of high boiling point liquids.
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Crude Oil Package for Vapor Pressure
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The GRABNER INSTRUMENTS' Crude Oil Package is a comprehensive solution for the transport and measurement of the vapor pressure of crude oil according to ASTM D6377 (Expansion Method). The unique Floating Piston Cylinder allows safe sample transfer of “live crude oils” according to ASTM D3700 and eliminates the risk of evaporation of light hydrocarbon ends during transport. The Grabner Instruments crude oil package is also strictly in accordance with the Russian standard GOST 52340.
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Large Flow Liquid Source Vaporization Control System
LE Series
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A high-flow, high-efficiency, liquid vaporizer with flow channels and heater elements embedded in a cast aluminium block which ensures maximum heat transfer, and the elimination of both cold spots and the risk of condensation. This Liquid Source Vaporization Control System can operate at up to 300 °C and can vaporize up to 30g/min of IPA (or equivalent).
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Dynamic Vapor Sorption Analyzer
IGAsorp-CT
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The IGAsorp-CT is a fully automated dynamic vapor sorption analyzer for the measurement of water and organic solvent isotherms and kinetics on a wide range of materials. Operating at temperatures from 5 to 85 °C and humidity values from 0 to 98 %RH, the IGAsorp-CT offers the widest combined range of any DVS analyzer. An optional internal heater allows fully programmable pre-heating and thermal desorption measurements to 350 °C.
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Dynamic Vapor Sorption Analyzer
IGAsorp
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The IGAsorp is a fully automated compact benchtop DVS analyzer, for fast and accurate vapor sorption measurements using the dynamic flow technique for water and organic solvents. Measured vapor uptake isotherms and kinetics are used to characterize, test and evaluate materials in precisely defined environmental conditions.
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Atomic Layer Deposition Systems
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Atomic Layer Deposition (ALD) is a powerful way to build ultra-thin, super-precise coatings, one atomic layer at a time. It’s especially useful and efficient when working with tiny, complex 3D structures, making it a go-to technique in advanced semiconductor manufacturing.
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Vapor Mass Flow Controllers
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Heated pressure-based mass flow controllers are designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas.
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Internal Vapor Analyzer
IVA® MODEL 210S
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The IVA® system is specifically designed for the quantitative analysis of low molecular weight gases contained in hermetic packages, cavities and other enclosures. The Model 210s concept integrates automated hardware with easy-to-use icon-driven software. Its design permits routine quality control, failure analysis and research level testing operation as a turn-key analytical system. The IVA® Model 210s includes a high-performance, quadrupole-mass spectrometer analyzer, a sample-mounting interface and precision hardware. The instrument is also computer-controlled and equipped with exclusive ORS integrated system control software — which provides instrument control, data analysis, data archiving and ease of operation.
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Vapor Pressure Tester
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The MINIVAP laboratory and process vapor pressure analyzers are the worldwide accepted standard instruments for the determination of the vapor pressure of gasoline, crude oil and LPG.
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Product
Cold Vapor Atomic Fluorescence (CVAF) Mercury Analyzer
QuickTrace M‑8000
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The QuickTrace® M-8000 Cold Vapor Atomic Fluorescence (CVAF) mercury analyzer is ideal for ultra-trace to sub-mg/L mercury quantitation. Due to the high sensitivity of the M-8000, it easily achieves the ultra-trace detection limit of <0.05 ng/L total mercury that is demanded by customers following EPA method 1631. The QuickTrace® M-8000 is also versatile enough to analyze samples >400 µg/L without dilution in a research or industrial setting.
