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Metrology
field of measurement.
See Also: Measurement, Instrumentation, Coordinate Measuring Machines
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Thermal Warpage Measurement Tool
PS600S
The TherMoir PS600S is a metrology solution that utilizes the shadow moir measurement technique combined with automated phase-stepping to characterize out-of-plane displacement for samples up to 600 mm x 600 mm. With time-temperature profiling capability, the TherMoir PS600S captures a complete history of a sample's behavior during a user-defined thermal excursion.
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Measurement Systems
MicroMeasure3D
Sciences et Techniques Industrielles de la Lumière
STIL MicroMeasure3D, PORTICO3D and MAESTRO3D are measurement systems designed to achieve true 3D metrology of each point for the most demanding applications adapted to Industry 4.0 standards.
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Full Range Photodiode Array UV-VIS-NIR-SWIRLaboratory Spectroradiometers
The SR-Series of full range laboratory spectroradiometers is ideal for a wide range of applications, including:*Solar radiance and irradiance measurements*Solar simulator test and classification*LED, laser, light source metrology*Radiometric calibration transfer*Remote sensing applications
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Ultrastable Microwaves
Ultra-stable microwave sources are paramount for a broad range of applications, including precision metrology, deep space navigation, telecom and next generation wireless communication, as well as coherent radar. With the PMWG-1500 Menlo Systems offers a unique commercial solution for providing ultrastable microwaves in an all-in-one solution.
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3D Scanning System
CyberGage360
Unprecedented combination of speed, accuracy and one-button simplicity for non-contact automated 3D scanning inspection.CyberGage360 dramatically Speeds Up Quality Assurance of Incoming Parts Inspection & In-Process Inspection of components on the manufacturing floor; Lowers Cost of Quality & Speeds Up Product Time-to-Market. Designed for use in general purpose metrology, the CyberGage360 has a range of potential industrial applications from automotive to aerospace to consumer electronics, where high accuracy and high speed throughput are important.
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Inspection Systems
EVG's metrology solutions for wafer inspection and measurement are optimized for lithography and all types of bonding applications. Customers can choose between integration of the metrology technology within fully-automated equipment, or stand-alone metrology systems serving multiple process steps. EVG's metrology solutions are optimized to maximize our customers' production yields, featuring:
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Smart Factory Inspection System
API, recognizing manufacturing industry’s increasing demand for part measurement automation, with a higher degree of accuracy, has developed its Smart Factory Inspection System with true 6 Degrees of Freedom (6DoF) real-time 3D robotic measurement incorporating its proven metrology technology and calibration components.SFIS can be delivered as a customized integrated solution or as a standard production inspection cell.
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Metrology
SV TCL also has the capability to emulate the testing environment with our probe card analyzers including newly installed direct dock analyzers in the United States, Taiwan and Vietnam. SV TCL is dedicated to continuous product improvement so that we can provide our customers the latest and most innovative test solutions.
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Near Infrared Subsurface Defect Detection and Review Systems
DDR200/300 NIR
The McBain DDR200 NIR (for 200mm) and DDR300 NIR (for 300mm) provide high-speed defect detection and precision measurement on wafers and other parts. These cost-efficient systems offer unique advantages for both production and process development use, providing an optimum near-infrared (900-1700nm) solution when both subsurface defect detection and dimensional metrology are required.
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Process XRR, XRF, and XRD metrology FAB tool
MFM310
Thickness, density, roughness & composition of films on blanket and patterned wafers. The Rigaku MFM310 performs high-precision measurements not possible by optical or ultrasonic techniques. This sophisticated X-ray metrology tool makes it practical to perform high-throughput measurements on product and blanket wafers ranging from ultrathin single-layer films to multilayer stacks.
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Metrology System
IVS
The IVS 220 system is the latest generation in the IVS series and has been designed for ultimate precision, TIS (tool induced shift) and throughput on 200mm wafers. The cornerstone of the system’s reliability and stability is its mean time between failure (MTBF) of 2,100 hours. The IVS 280 provides the same capability in a package designed for overhead track handling with full E84 GEM300 capability.
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Xytronic Three-Phase Reference Standard +/- 0.04%, +/- 0.02%, +/- 0.01%
RADIAN RX-30, RX-31 and RX-33
Radian Research is committed to providing our customers with leading innovative and technologically superior products, while maintaining metrology capability in power and energy measurement that is surpassed by none. Our engineers drew on the expertise and knowledge we acquired for our industry-leading legacy RM (Metronic) and RD (Dytronic) reference standards to develop the RX (Xytronic), the ultimate in power and energy measurement technology perfection.
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Pregius Global Shutter CMOS USB3 Camera
Lt-C/M4020
The top priority for a vision system designed to be transported is size and weight. The Teledyne Lumenera Lt-C/M4020 camera offers an easy-to-handle form factor that can be integrated into a variety of designs such as handheld vision systems. The Lt-C/M4020 camera is also an obvious choice for applications in machine vision such as flat panel inspection, metrology, and robotics where a camera needs to fit into a predetermined space. The smaller footprint and lower weight means vision system designers do not have to be concerned with heavy and bulky hardware when looking to maximize imaging performance.
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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Software
Measuring, evaluation and management software enables you to increase the performance of all your metrology operations.
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Engineered Measurement Solutions
Our mission is to deliver integrity based calibration services, cost effective metrology engineering solutions for individual customer requirements, reputable instrument repair services, sales of industry-known brands of test equipment, and full service test engineering, from integration of hardware and software, to documentation and training.
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Wafer Inspection Products
Sonix provides manual and automated wafer inspection and metrology systems for wafers ranging from 100mm to 300mm, with extensive analysis capabilities at both the wafer and device level. These industry-leading automated wafer inspection systems are used by the world’s top manufacturers to ensure quality from development through production.
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Micro-spot DUV Reflection and Transmission Spectrophotometry
FilmTek 3000 PAR
Scientific Computing International
Metrology system with a 50µm spot that delivers high-performance transmission and reflection measurement of patterned films deposited on transparent substrates. Ideally suited for measuring the thickness and optical constants of very thin absorbing films.
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E-beam Metrology And Inspection
Our HMI e-beam solutions help to locate and analyze individual chip defects amid millions of printed patterns.
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Optical Thin-Film Metrology for Advanced Thin Films
FilmTek 6000 PAR-SE
Scientific Computing International
Production-proven metrology system for film thickness, refractive index and stress measurement for a broad range of film layers at the 1x nm design node and beyond. Accommodates 200 or 300 mm wafer metrology. Combines spectroscopic ellipsometry and DUV multi-angle polarized reflectometry with a wide spectral range to meet the challenging demands associated with multi-patterning and other leading-edge device fabrication techniques.
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Materials Metrology
VeraFlex Family
Nova Measuring Instruments Inc.
World-class XPS and XRF metrology technologies for semiconductor process control.
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Vision Measurement Technologies
Some manufacturers of metrology systems utilize one single technology to measure a wide range of components despite the different form factor of each of the components, which can drastically affect the quality of the measurement.
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Automated Semiconductor Wafer Optical Inspection and Metrology
SITEview Software
Microtronic SITEview Software is designed from the end-user operator’s perspective and is easy to use, fully featured, and modular. Applications include visual wafer inspection, OCR sorting, wafer defect review, second optical inspection, image storage and retrieval, laser marking, microscope interface, and GEM/SECS II communication and seamlessly integrates with EAGLEview, MicroINSPECT and MicroSORT.
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Metrology Search Engine
Qualer Search
Qualer Search is the first metrology search engine that enables you to find potential partners based on services provided and their location.
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High Precision Angular Positioning, Calibration and Geometry INspection
LabStandard AIR
Rotary Precision Instruments UK Ltd
Ultra precise rotary tables intended for fine inspection, metrology and test applications.The LabStandardAIR has been designed as a “Contact Free” system and eliminates features, which may detract from achieving the optimum rotational performance. The rotating elements are supported on super high precision, air lubricated, hydrostaticbearings and are not subject to disturbances associated with gear drives.
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Thin Film Metrology Systems
Gemini Series
The n&k Gemini-TF, Gemini-TF-M and Gemini-FPD are specifically designed for measurements of patterned and unpatterned films on transparent or opaque substrates. These tools are used extensively for solar cell, flat panel and photomask applications. The tools belonging to the Gemini-TF Series are based on unpolarized Reflectance (R) and unpolarized Transmittance (T) measurements, with a 50μm spot size for both R and T. R and T are simultaneously measured to determine film thickness and n and k spectra from 190nm – 1000nm
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Dimensional Metrology
Stand-Alone Metrology Family
Nova Measuring Instruments Inc.
Nova’s stand-alone metrology platforms are utilized to characterize critical dimensions such as width, shape and profile with high precision and accuracy and are used in multiple areas of the fab such as photolithography, etch, CMP and deposition in the most advanced technology nodes, across all semiconductor leading customers.
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Thermal Warpage and Strain Measurement Tool
PS200S
The TherMoir PS200S is a metrology solution that utilizes the shadow moir measurement technique combined with automated phase-stepping to characterize out-of-plane displacement forsamples up to 150 mm x 200 mm. With time-temperature profiling capability, the TherMoir PS200S captures a complete history of a sample's behavior during a user-defined thermal excursion.
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Reticle Manufacturing
An error-free reticle (also known as a photomask or mask) represents a critical element in achieving high semiconductor device yields, since reticle defects or pattern placement errors can be replicated in many die on production wafers. Reticles are built upon blanks: substrates of quartz deposited with absorber films. KLA’s portfolio of reticle inspection, metrology and data analytics systems help blank, reticle and IC manufacturers identify reticle defects and pattern placement errors, thereby reducing yield risk.
