Particle
fundamental objects of quanta.
See Also: Nanoparticle, Airborne Particle, Particle Accelerator, Particle Counters, Particle Detection, Wave
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Product
Dynamic Image Analysis (DIA)
CAMSIZER
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Dynamic Image Analysis (DIA) is a modern high-performance method for the characterization of particle size and particle shape of powders, granules and suspensions. Retsch Technology's optical analyzers CAMSIZER P4 and CAMSIZER X2 are based on this technology, covering a measuring range from 0.8 m to 30 mm.
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Product
Magnetic Particle Inspection(MPI)
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Magnetic particle inspection is an inspection method used to identify defects on the surface of ferromagnetic materials by running a magnetic current through it.
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Product
Smallest Multimetric Nanoparticle Detector
partector 2
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Naneos Particle Solutions gmbh
The naneos partector 2 is the world's smallest multimetric nanoparticle detector. The partector 2 uses dual non-contact detection stages to measure not only lung-deposited surface area like the partector 2 Light, but also particle number concentration and average particle diameter. Additionally, ultrafine particle (UFP) surface and ultrafine particle mass concentrations are calculated and displayed. In contrast to some of our competitors, the UFP mass is displayed online, and it is calculated using the measured diameter of the particles, rather than estimated by a simple multiplier for LDSA.
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Product
Aggregation Analysis System For Biopharmaceuticals
Aggregates Sizer
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The "Aggregates Sizer" aggregation analysis system enables the quantitative evaluation of particle amounts in the SVP range as a concentration (unit: μg/mL). Aggregations of biopharmaceuticals can be categorized into 3 ranges: IVP (In-visible Particle), SVP (Sub-visible Particle), and VP (Visible Particle), according to their particle size. Until now, no particle size analyzer could cover the SVP range with a single measurement. Therefore, multiple methods had to be used. Aggregates Sizer completely covers the SVP range.
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Product
Turbidity And Standard Meters
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Accurately measure the cloudiness of a fluid caused by suspended particles with turbidity meters and standards from HF scientific. Our turbidity meters and standards instruments include features that simplify installation, maintenance, and data access.We offer reliable turbidity meters including an online turbidity meter, handheld turbidity meter, and benchtop turbidity meter.
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Product
Particle Deposition Systems
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MSP’s 2300G3 Particle Deposition System sets the standards for wafer inspection and metrology equipment. This advanced tool is vital for increasing the yield of future leading-edge devices, while meeting the measurement needs of today.
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Product
Frequency Conversion Rotating Magnetic Fla
MT-2XCF
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MITECH MT-2XCF rechargeable frequency conversion rotating magnetic flaw detector is based on principle that the leakage magnetic field can absorb the magnetic powder. Make use of magnetic yoke magnetized the workpiece of ferromagnetic material. If there has defects it will produce leakage magnetic field that will adsorb magnetic powder. We could detect the flaw by observing the density of adsorption magnetic powder. It adopts large capacity lithium battery. By the inverter and the phase shifted signal processor to provide power for the detector, it solves the shortcomings of traditional magnetic particle detector relying on the 220V power supply. It has low power consumption and can continuous work for more than 6 hours. And the battery can be charged when the detector is on and off. Especially suitable for the field testing. It can choose the current frequency according to the flaw depth with unique frequency conversion communication design, that improve the detection sensitivity. It’s widely used in aircraft manufacturing, boiler and pressure vessels and other fields. It is a necessary professional precision instrument of quality control, in-service safety monitoring and life assessment.
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Product
LIDAR
Wall-E
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Polarization LIDAR aiming to detect particle orientation. A novel polarization LIDAR system capable of monitoring possible dust orientation and microphysical properties.
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Product
Defect Inspection and Review
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KLA’s defect inspection and review systems cover the full range of yield applications within the chip and wafer manufacturing environments, including incoming process tool qualification, wafer qualification, research and development, and tool, process and line monitoring. Patterned and unpatterned wafer defect inspection and review systems find, identify and classify particles and pattern defects on the front surface, back surface and edge of the wafer. This information allows engineers to detect, resolve and monitor critical yield excursions, resulting in faster yield ramp and higher production yield.
