Thin Film
layer of material ranging < a nanometer to > a micrometer in thickness.
See Also: Film, Ellipsometers
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Low Noise Amplifiers
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RPG Low Noise Amplifiers are developed and manufactured using the most modern discrete components and thin film technologies, in order to cover the frequency range 50 to 350 GHz. With improved DC-supply and modern semiconductors these amplifiers not only deliver low noise performance but also broad operating bandwidth and gain flatness. These low-noise amplifiers are available as a standard product and on request as customized manufactured product.
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Product
Polarization Maintaining Band Pass Filter
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Zhongke Rayzer Optical Technology Co.,Ltd
Selects the thin film filter withgood performance to ensure the high quality opticalperformance, stability and reliability. It is uses to shieldnoise signal in EDFA and fiber laser system. It has thecharacteristics of high isolation, low insertion loss, highreturn loss and high power.
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Infiniium Oscilloscopes
Z‑Series
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The Infiniium Z-Series delivers this and more with its RealEdge technology enabling 63 GHz of oscilloscope bandwidth and superior signal integrity. The Z-Series takes advantage of indium phosphide chip technology and custom thin film packaging to give you extremely low noise, low jitter, and high effective number of bits. These technologies allow you to see the true representation of your signal.
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PLD Systems
Pulsed Laser Deposition
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Is a versatile thin film deposition technique. A pulsed laser (~20 ns pulse width) rapidly evaporates a target material forming a thin film that retains target composition. This unique ability of stoichiometeric transfer of target composition into the film was realized first by the research team led by Dr. Venkatesan at Bell Communications Research, NJ, USA, nearly 30 years ago while depositing high temperature superconducting (YBa2Cu3O7) thin films. Since then, PLD has become the preferred deposition technique where ever thin films of complex material compositions are considered. Another unique feature of PLD is its ability for rapid prototyping of materials. The energy source (pulsed laser) being outside the deposition chamber, facilitates a large dynamic range of operating pressures (10-10 Torr to 500 Torr) during material synthesis. By controlling the deposition pressure and substrate temperature and using relatively small target sizes, a variety of atomically controlled nano-structures and interfaces can be prepared with unique functionalities.
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Product
Semiconductor Technology, Micro Scriber + Flatness, Bow, Warp, Curvature, Glass Thickness
FLATSCAN
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Optik Elektronik Gerätetechnik GmbH
Non contact automated 2D- or 3D measurement of warp, bow, slope and surface curvature with software module for calculation of thin film stress (wafer stress) of wafers and glass substrates.
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ALD For Manufacturing And Production
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Uniformity over large substrates, reproducibility, and low temperature deposition make ALD an ideal candidate for the next generation of large-scale manufacturing thin film technology.
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Ceramic Process Carrier Pallets
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Ceramic engineering specializing in Silicon Carbide, Boron Carbide, Alumina, Zirconia and Lead Zirconate Titanate (PZT) based ceramics, composites and thin films for High Strength, high temperature, semiconductive ceramic designed for use in wafer fabrication or hybrid circuits in vapor deposite ovens. Test Electronics will precision drill and customize pallets for your circuit board. Click on the Quote tab on the left then click on the Carrier Pallets tab to get an instant quotation on your process carrier pallets.
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Product
Spectroscopic Ellipsometry
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Spectroscopic ellipsometry is a surface-sensitive, non-destructive, non-intrusive optical technique widely used for thin layers and surface characterization. It is based simply on the change in the polarization state of light as it is reflected obliquely from a thin film sample. Depending on the type of material, spectroscopic ellipsometers can measure thickness from a few Å to tens of microns. It is also an excellent technique for multi-layers measurement.
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Product
Scanning Auger Nanoprobe
PHI 710
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The PHI 710 Scanning Auger Nanoprobe is a unique, high performance Auger Electron Spectroscopy AES instrument that provides elemental and chemical state information from sample surfaces and nano-scale features, thin films, and interfaces. Designed as a high performance Auger, the PHI 710 provides the superior Auger imaging performance, spatial resolution, sensitivity, and the spectral energy resolution needed to address your most demanding AES applications.
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Materials Metrology
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Nova is a market leader for innovative thin film metrology and process control technologies. We develop highly sensitive in-line metrology solutions on high productivity platforms, thereby enabling critical metrology solutions to be closer to a semiconductor fab’s process and integration needs.Our technologies enable customers to accurately detect and quantify small variations in film composition and thickness, thereby influencing better device functionality, and improved manufacturing yield.
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Metrology Solutions for Semiconductors
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Bruker Semiconductor develops, manufactures, markets, and supports metrology solutions for thin films, which are based on novel, rapid, non-contacting and non-destructive X-ray technology. With Bruker’s acquisition of Jordan Valley Semiconductors, a name synonymous with unparalleled worldwide customer service and support, 75% of the world's top 25 semiconductor manufacturers rely on Bruker metrology tools for front-end and back-end applications, including development of their next-generation thin films. Bruker commitment to innovation and technology leadership drives the continued release of new advancements in metrology, and has garnered numerous awards and industry recognition.
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Product
Dynamic Ultra Micro Hardness Tester
DUH-210/DUH-210S
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A new evaluation system for measuring the material strength of micro regions, such as semiconductors, LSI, ceramics, hard disks, vapor deposited films, and thin coating layers, not addressed by previous hardness testers. It can also be used to evaluate the hardness of plastics and rubbers. This instrument uniquely measures dynamic indentation depth, not the indentation after the test. This in turn permits measurement of very thin films and surface (treatment) layers that are impossible to measure with conventional methods. Additionally, this same method supplies the data needed to calculate elastic modulus on the test specimens.
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100GHz/200GHz DWDM Module in LGX Box
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Flyin Optronics’ 100GHz/200 GHz dense wavelength division multiplexer (DWDM module) utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging to achieve optical add and drop at the ITU wavelengths. It provides ITU channel center wavelength, low insertion loss, high channel isolation, wide pass band, low temperature sensitivity and epoxy free optical path . It can be used for wavelength add/drop in telecommunication network system.
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Thin Film
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Bourns precision thin film resistors have tight resistance tolerances, extremely low temperature coefficiency and wide range of resistance value which makes them ideal for high precision applications. Excellent stability, low noise characteristics are achieved by using thin film sputtering technology on ceramic substrates and high precision laser trimming process.
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Pure Boron Foils
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MICROMATTER™ boron foils are also produced by laser plasma ablation; however, the deposition process is much more complex and time consuming than that for diamond-like carbon. Accordingly, only thin films, mainly designed for beam stripping of heavy ions in electrostatic accelerators, are available. All films are generally delivered on glass substrates coated with a release agent.
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Product
SMD/Chip Resistors
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Panasonic Industrial Devices Sales Company of America
Panasonic offers a wide range of SMD/Chip Resistors including conventional Thick Film and Precision Thick Chip Resistors as well as specialized Resistors such as Thin Film, Metal Film Chip, Current Sense and more.
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Flashlight Solar Simulator
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Flashlight Solar Simulators have the advantage of negligible temperature change to the solar cell. For this reason, they are primarily used in cell and module production environments. Also, they are a more budgetary alternative if large cell areas are to be illuminated, because it is easier to have excellent light uniformity on areas of 8 in x 8 in or larger. So, this type of solar simulator is also used for analysis of large area thin film solar cells. But care must be taken, as some materials (e.g. CIGS) have long inherent time constants, so that the pulse length (better: flash plateau) must be chosen accordingly.
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Product
3-Axis Non-Robotic Automated Testing System
AT3
Test Instrument
The Instron AT3 is a space-efficient, highly adaptable 3-axis mechanical testing platform designed for automated execution of tensile, compression, flexural, and lap shear tests. Built to comply with a broad spectrum of ASTM and ISO standards, it’s well-suited for evaluating materials such as plastics, elastomers, thin films, foils, and metals. The system streamlines the entire testing workflow from specimen measurement and handling to strain measurement and specimen disposal—enabling users to load up to 160 samples and let the AT3 take care of the rest. Boost productivity, reduce manual intervention, and achieve consistent, dependable results with every test cycle.
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CWDM OADM Module(4,8,16,18-Channel)
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Flyin Optronics' Coarse wavelength division multiplexer (CWDM Mux/Demux) utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provides low insertion loss, high channel isolation, wide pass band, low temperature sensitivity and epoxy free optical path.
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3 port FWDM in 1U Rackmount
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Flyin Optronics' Micro-Optical WDM utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provides low insertion loss, high channel isolation, low temperature sensitivity and epoxy free optical path.
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FWDM Module
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Flyin Optronics' Micro-Optical WDM utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provides low insertion loss, high channel isolation, low temperature sensitivity and epoxy free optical path.
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Stylus Profilers
Dektak
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Bruker's Dektak® stylus profilometers are the culmination of over five decades of proprietary technology advances. They provide repeatable, reliable, and accurate measurements — from traditional step height measurements and 2D roughness surface characterization to advanced 3D mapping and film stress analyses. With over 10,000 systems installed around the world, Dektak surface profilers have been widely accepted as the gold standard for measuring thin film thickness, stress, surface roughness and form in diverse applications areas from academic research to semiconductor process control.
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Metrology System
IMPULSE V
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With tighter wafer-to-wafer and within-wafer uniformity tolerances, integrated metrology systems are in use across various semiconductor processing steps. Based on demonstrated high-resolution optical technology, the IMPULSE V system provides higher sensitivity to thin film residue measurements during the CMP process. The IMPULSE platform boasts the industry’s most reliable hardware with best-in-class reliability and productivity metrics.
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OhmegaPly®
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For many years Teledyne Labtech has manufactured RF & Microwave PCB with integrated OhmegaPly® resistors. OhmegaPly® is a thin film resistor-conductor material. Using standard subtractive printed circuit technology, integral resistors are formed on circuit layers. These resistors can be buried within a Multilayer circuit board or used on the board surface. The resistors can also be used mounted on Metalbacked PCB.OhmegaPly® is available in 25 ohm per square, 50 ohm per square and 100 ohm per square sheet resistivity.
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Trace Moisture Analyzer
Model 8800P
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Teledyne Analytical Instruments
The 8800 series uses field proven aluminum oxide (Al2O3) sensing technology to accurately detect trace moisture on either a continuous or spot checking basis. All Al2O3 sensors share the same basic operating principle: the capacitance measured between the sensor’s aluminum core and gold film deposited on the oxide layer varies with the water content. The 8800 series moisture sensor employs unique Hyper Thin Film (HTF) technology, which offers three major structural improvements in Al2O3 sensor design. These structural changes, noted below, provide the user with increased sensitivity, greater stability and a quicker response time when compared to other conventional aluminum oxide sensors on the market today.
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Thin Films, Plasma and Surface Engineering
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A residual gas analyser for vacuum process analysis. Measures the vacuum process gas composition, contamination and leak detection.
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Thin-Film Thickness Measurement Systems
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The Filmetrics® range of affordable reflectometers deliver high-precision thin-film thickness measurements in seconds. These easy-to-use tools, combined with intelligent software and a broad range of accessories and configurations, provide maximum versatility in film thickness measurements ranging from 1nm to 3mm.
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Plasma Profiling TOFMS
PP-TOFMS
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Plasma Profiling TOFMS addresses the needs of materials scientists across a wide range of application areas. PP-TOFMS provides fast elemental depth distribution of any inorganic material. The speed and ease of use of PP-TOFMS permit to reduce optimization time of growth processes as many research scientists strive to reduce the time from discovery to applications of new materials.The simultaneous full coverage of TOFMS available for each point of depth permits the detection of non suspected contamination. This is key for failure analysis and optimization of thin film processes that tend to no longer be based on ultra-high grade methods (i.e. ink jet printing…).
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Remote Plasma Sources
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Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
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Product
1550 & 1310/1490nm MWDM
WD1543
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Hangzhou Huatai Optic Tech. Co., Ltd.
WD1543 WDM is based on mature thin film filtering tech, with wide bandwidth, flatness, low insertion loss and high isolation. It is mainly applied to FTTx PON network to achieve the combination and separation of the 1550nm (CATV) and 1310/1490nm (data).
