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Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Immersion Systems
Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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EUV Lithography
NXE systems
NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Detectors
Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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X-Ray Cameras for Soft X-Ray, VUV, and EUV Applications
SOPHIA® XO
Teledyne Princeton Instruments
SOPHIA® XO offers high-sensitivity (>95% QE) and high-speed for the widest range of VUV and x-ray detection, with thermoelectric cooling up to -90℃ and high frame rates. With a rotatable, industry-standard CF flange and high-vacuum seal design the software-selectable gains and readout speeds make this camera well suited for UHV applications.
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wavefront sensors
HASO EUV
Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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EUV (Extreme UltraViolet) Chucks
Lightweighted and low-expansion chucks with 10nm active-area flatness are required in EUV lithographic tools. These chucks also have low outgassing and low particle generation.
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EUV Lithography Systems
Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Patterning Simulation
KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Dry Systems
Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Gratings for Synchrotron, FEL and EUV Light Sources
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Ultraviolet Light Distribution Measurement Film
UVSCALE
UVSCALE is a film that responds to UV light, and changes color depending on the amount of light it is exposed. This makes it easy to see UV light distribution. There are a roll type and a sheet type, with three types for different amounts of light.
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Ultraviolet Microscope
UVM-1
The UVM-1™ is a UV microscope that also can image in the visible and NIR. This UV-visible-NIR microscope embodies both advanced optics for cutting edge UV, color and NIR imaging and visualization. The system is a flexible design, very easy to use and very durable. It is designed with cutting edge CRAIC optics for the highest image quality and to give years of service.
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Ultraviolet Analyzers
Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Deep Ultraviolet Observation System for Microscope
U-UVF248
Model Capable of High-magnification/High-contrast Deep Ultraviolet (DUV) Observation. A Semiconductor / FPD Inspection Microscopes.
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Light Source
FiberPal OT-3000
The OT-3220/3221 is designed for a high performance stabilized laser source, especially in practice for FTTX networking installation and maintenance fieldworks environment requirements. It is usually applied as stable laser sources for wide range of optical testers and tools in optical fiber cabling and transmission systems.
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Light Source
UVF-205S
By use of the light guide with the quartz sensor fiber, feed-back control and monitoring of UV irradiation intensity is possible. Also setting of UV intensity and meaurement by personal computer is possible
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Reading Lights
Our Carat® lights offer a wide range of fully customized reading light solutions crafted for your unique needs.
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Light Sources
For applications such as transmission, absorption, and reflection, illumination sources are needed. Avantes offers a wide range of different types of light sources, to suit your specific application needs. An overview of the different types of light sources can be found below.
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Light Source
UVF-502S
In combination use with the uniform exposure unit, selection of uniform irradiation area in the range of 80mm200mm is possible.
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Light Testers
Hall’s have designed and manufactured products for oil, industrial, farming, commercial, and transportation markets. Products such as truck and trailer light testers, bop savers, early engine warning systems, oil spinners, engine control panels, dashes for service rigs, drillers panels, and sandline controls. Halls have been involved with over the rebuilding from scratch of over twenty service rigs.
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Light Meters
Our light meters are designed for simple and accurate results in an industrial setting. Whether you are checking work spaces, parking lots, or baseball fields for safe levels of lighting or measuring for testing design compliance, a light meter from Sper Scientific will get the job done. Obtain precise UV, FC or Lux measurements, in multiple light measurement ranges. These light meters are designed for use in work spaces, labs, schools, outdoor studies, optics, home inspections, and many others. In addition, you may use these meters to check compliance with ANSI/NFPA 101 (standards for emergency & exit lighting).
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Light Sources
Excelitas offers an array of illumination and lighting technologies with custom design capabilities aligned with customer requirements to deliver an illumination solution optimized to your specifications. From simply supplying a discrete LED, Laser, Lamp or UVC source to providing a complete, integrated system, Excelitas consistently delivers lighting solutions for the most demanding applications.
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Light Sources
These external units provide illumination which is transmitted to the viewing instrument by a light guide cable, and then through the scope via the integral fiber bundle to the viewing tip.
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Light Meters
TES Electrical Electronic Corp.
Dual Display, 4 digit LCD reading.Spectral Sensitivity close to CIE phototropic curve.Measuring levels ranging 0.001 to 1999kAccurate and instant response. Luminance ratio A/B
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Light Meter
PLMT56
Light Meter Measures In LuxOver-Range IndicatorLong-Life Silicon Photo Diode InsideMeasurement Rate: 1.5 Times per SecondMax Range: 50,000 LuxAccuracy: +/- 5% Under 10000 Lux, +/- 10% Over 10000 LuxMax Resolution: 0.1 LuxDimensions: 7.40' H x 2.52' W x 0.96' DAccessories Included: 12V A23 Battery, Photo DetectorSold as : Unit
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Light Analysis
Welcome to Thorlabs; below you will find links to detectors and instrumentation that measure the various properties of light, a subset of our entire line of photonics products. Thorlabs offers an extensive selection of instruments that measure the properties of light. Our versatile power and energy meters can be used with over 25 different sensors in order to make NIST-traceable power and energy measurements. If the convenience of a meter is not desired, our selection of detectors includes basic photodiodes (uncalibrated and calibrated), photodetectors (biased, amplified, and avalanche), CCD and CMOS arrays, position detectors, integrating spheres, and photomultiplier tubes. The Beam Characterization category contains beam profilers (camera and scanning slit), a wavefront sensor, spectrometers, and interferometers, while the Polarimetery link leads to a selection of instruments used to measure and control the polarization of light.
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Light Source
UVM-SP-JW
Readouts of UV intensity and cumulative luminescence count are prompted either on the front panel or via the externally connected remote signal control. The UV intensity detection segment is intended to measure a specific intensity of light signals, while the cumulative luminescence count is designed to tally a cumulative count on all UV intensities measured, in conjunction with real-time calibration.
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Serial FPDP Extreme 1/2 ATR Recorder
Talon RTX 2596
- Rugged 1/2 ATR MIL-spec chassis for harsh mechanical and thermal environments- Environmentally sealed, conduction-cooled- Fully sealed for RF emissions with EMI power line filter- MIL-STD circular connectors- Compact and lightweight design - 18 lb (8 kg)- QuickPac® drive packs allow quick removal of all data storage up to 61 TB via the front panel- Ideal for UAVs, military vehicles, aircraft pods and outdoor environments- Four-channel Serial FPDP record/playback- Supports Flow Control, CRC, and Copy/Loop Mode as a receiver and transmitter- Supports 1.0625, 2.125, 2.5, 3.125 and 4.25 GBaud link rates- Single-mode and multi-mode fiber interfaces available- Sustained real-time record rates up to 4 GB/s- 12 to 28 VDC power supply- Optional GPS receiver for precise time and position stamping- SystemFlow API, GUI and Signal Viewer analysis tools- Optional telnet remote connection to recorder
