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Product
wavefront sensors
HASO EUV
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Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Product
Scanning Electron Microscope
E5620
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The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Product
Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
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The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Product
Immersion Systems
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Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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EUV Lithography Systems
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Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Product
Semiconductor
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Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Product
EUV Lithography
NXE systems
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NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Product
Gratings for Synchrotron, FEL and EUV Light Sources
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HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Product
Patterning Simulation
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KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Product
Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Product
Detectors
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Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Product
EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Product
Ultraviolet Analyzers
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Teledyne Analytical Instruments
Ultraviolet Analyzers by Teledyne Analytical Instruments
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Product
Extreme Temperature Passive Probe
N7007A
Oscilloscope Probe
Many environmental test engineers today are using standard-temperature probes in extreme temperature condition, which causes physical damage to the probe. Another common practice among environmental test engineers is to simply attach long wires at the end of their probes, which significantly degrades measurement performance due to excessive inductance and reduced bandwidth. Keysight addresses this issue with the N7007A single-end passive probe.
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Product
DXG Deep Ultraviolet
DXG Series
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Engineered for versatility and performance, the DXG Nd: YAG Laser Series powers a wide range of applications, from high-precision material processing to marking, scribing, and advanced manufacturing. With air-cooled, water-cooled, and long-pulse options, DXG lasers provide high energy, stability, and efficiency, ensuring superior results in industrial, scientific, and semiconductor applications.
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Product
PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
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Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Product
Light Meter
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Shenzhen UYIGAO Electronic Technology Co., Ltd
Digital Luxmeter Lux light meter for photography Photometer Mini spectrometer spectrophotometer Luminometer
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Product
Light Source
pE-300ultra
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CoolLED's pE-300ultrais a fluorescence microscopy light source which offers intense, broad-spectrum LED illumination for imaging most common fluorescent stains. Users have access to both microsecond switching via multiple TTL inputs and the ability to mount inline excitation filters. This, when paired with today's high performance multi band filter sets, facilitates imaging traditionally done via a white light source and a filter wheel, with all the benefits of LED.
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Product
Light Source
FiberPal OT-3000
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The OT-3220/3221 is designed for a high performance stabilized laser source, especially in practice for FTTX networking installation and maintenance fieldworks environment requirements. It is usually applied as stable laser sources for wide range of optical testers and tools in optical fiber cabling and transmission systems.
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Product
Ultraviolet Meter
UVR Series
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UVR series is suitable to manage lamp of ultraviolet curing equipment, Also suitable to measure intensity of ultraviolet ray for sun light and lamp.
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Product
DC-AC Sine Wave Inverters for Ultraviolet (UV) Lamps
UV Lamp Inverters
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The sine wave inverters are designed and built to meet any customer input/output and mechanical configuration requirements.
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Product
Light Source
LS-BA
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Balance Light Source (LS-BA) is designed for transmittance and absorbance measurement with color information. Halogen Light source provides the stable and smooth wide-band spectral output. It’s proper for most visible to near infrared range measurement. The efficiency of blue region will be enhanced by extra two blue LEDs.
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Product
Serial FPDP Extreme 1/2 ATR Recorder
Talon RTX 2596
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- Rugged 1/2 ATR MIL-spec chassis for harsh mechanical and thermal environments- Environmentally sealed, conduction-cooled- Fully sealed for RF emissions with EMI power line filter- MIL-STD circular connectors- Compact and lightweight design - 18 lb (8 kg)- QuickPac® drive packs allow quick removal of all data storage up to 61 TB via the front panel- Ideal for UAVs, military vehicles, aircraft pods and outdoor environments- Four-channel Serial FPDP record/playback- Supports Flow Control, CRC, and Copy/Loop Mode as a receiver and transmitter- Supports 1.0625, 2.125, 2.5, 3.125 and 4.25 GBaud link rates- Single-mode and multi-mode fiber interfaces available- Sustained real-time record rates up to 4 GB/s- 12 to 28 VDC power supply- Optional GPS receiver for precise time and position stamping- SystemFlow API, GUI and Signal Viewer analysis tools- Optional telnet remote connection to recorder
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Product
Lighting Maintenance
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Lumen maintenance is the most useful gauge to determine the lifetime or useful light output rating of an LED light source.
