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EUV Lithography Systems
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Using extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible
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Semiconductor
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Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Detectors
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Solar blind detector for operation in the 1 to 180 nanometer region. It is encased in a vacuum tight housing for vacuum operation. The Model 425 is ideal for measurements in the Extreme and Vacuum UV (EUV and VUV) where the solar blind feature eliminates potential interference from long wavelength ultraviolet and visible light. It may be operated in pulse-counting mode or DC. The CEM is also available with coatings like Cesium Iodide or Magnesium Fluoride to enhance response in different energy regions.
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Product
Scanning Electron Microscope
E5620
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The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Product
Electrodeless Z-Pinch™10 Watt EUV Source
EQ-10
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The EQ-10 is a compact, easy-to-use, reliable, and cost-effective EUV light source, based on Energetiq's proven Electrodeless Z-pinch™ technology using Xenon gas. The EQ-10 EUV source is uniquely suited for metrology and research applications.
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Product
EUV Lithography
NXE systems
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NXE lithography systems are used in high-volume manufacturing of advanced Logic and Memory chips. The first systems to use ASML’s novel 13.5 nm EUV light source, they print microchip features with a resolution of 13 nm, which is unreachable with deep ultraviolet (DUV) lithography. Chipmakers use our NXE systems to print the highly complex foundation layers of their 7 nm, 5 nm and 3 nm nodes. Read about how EUV lithography went from imagination to reality.
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Gratings for Synchrotron, FEL and EUV Light Sources
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HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
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Dry Systems
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Chips are made up of many layers stacked on top of one another, and it’s not necessarily the latest and greatest immersion lithography machines that are used to produce these layers. In a given chip, there may be one or two more complicated layers that are made using an EUV lithography machine, but the rest can often be printed using ‘older’ technology such as dry lithography systems. This is certainly more cost-effective for customers, since these older machines are less expensive to purchase and maintain. Read about how dry lithography systems are enabling progress.
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Immersion Systems
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Immersion systems are the workhorses of the industry. Our latest NXT machines have shown the ability to run in excess of 6,000 wafers per day, with an average five percent productivity increase over 12 months, supporting our customers' value requirements. We continue to innovate our immersion systems to meet the requirements of future nodes, benefiting from commonalities in R&D with our EUV program, while ensuring the platform’s extendibility through System Node Enhancement Package upgrades. Thanks to these packages, any NXT system can be upgraded to the latest technology.
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Product
Patterning Simulation
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KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.
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Product
wavefront sensors
HASO EUV
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Imagine Optic's HASO EUV wavefront sensor, developed in conjunction with LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today's demanding laboratory and industrial applications.
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Product
EUV Lithography
EXE systems
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EXE, or ‘High NA’, systems are the latest generation in EUV lithography. With a numerical aperture (NA) of 0.55, their innovative new optics provide higher contrast and print with a resolution of just 8 nm.
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Product
Ultraviolet Checker
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For magnetic particle testing. Intensity of ultraviolet can be read directly in mw/c directly.
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Product
DXG Deep Ultraviolet
DXG Series
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Engineered for versatility and performance, the DXG Nd: YAG Laser Series powers a wide range of applications, from high-precision material processing to marking, scribing, and advanced manufacturing. With air-cooled, water-cooled, and long-pulse options, DXG lasers provide high energy, stability, and efficiency, ensuring superior results in industrial, scientific, and semiconductor applications.
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Extreme Environment Sensors
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For high pressure, low temperature, and high temperature applications* For applications requiring high accuracy, high reliability, and structural integrity.* Operating temperatures from -320°F to +1000°F (+1200°F short term).* Displacement systems withstand pressures up to 3500 or 5000 psi.* Dual-coil sensor design effectively minimizes radiation effects.* Hermetically sealed and laser welded.* Unaffected by environmental contaminants.
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Economic Extreme Power Temperature Forcing System
ECO Cool
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ECO Cool® Economical Powerful - Thermal Forcing System.Exceptionally Powerful, Economical & Reliable
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Product
Light source
UVM-MP
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Measurement of maximum of 6 points is possible. By use of thee sensor amplifier box, distance between the light receiving inlet and the controller can be extended to 10 meters. Measurement start signals can be independently output by remote control. This is useful for the light source fixtures integrating shutter mechanism.
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Light Meter
MODEL 5202
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Kyoritsu Electrical Instruments Works, Ltd.
Digital Light Meter 3 ranges changeable from low to high illuminance. (200/2000/20000lux) Data hold function. Digital light meter with separate light recieving sensor and meter.
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Light Sources
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The unique dual-output of equivalent beams make it a useful source for many comparative applications in addition to wavelength calibration and so on. The two output beams originate from two views of the single emitting spot where the electron beam from the single hairpin filament collides with the interchangeable anode.
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Product
INTERIOR LIGHTING
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Our ColourFlow fixtures are suitable for different types of indoor lighting, from accent lighting to colour-lighting entire spaces with ceiling heights of more than 18 metres. Some applications are architectural lighting, ambience lighting in hotels, restaurants and bars, theatre lighting or (accent) lighting for shops. The possibilities are endless with the ColourFlow RGBW and RGBA recessed, surface-mounted, pendant and track fixtures.
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Product
PCE-2000UV_1.5 Ultraviolet Light Radiation Measurement System
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Hangzhou Everfine Photo-E-Info Co., LTD
PCE-2000UV UV light source radiation Measurement system can realize the measurement of the relative spectral power distribution of ultraviolet LED, UV fluorescent lamp, UV light source, peak wavelength, half-peak wavelength, spectral radiation flux of UV-A/B/C, and the total radiation flux in specific wavelength.
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Light Analysis
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Welcome to Thorlabs; below you will find links to detectors and instrumentation that measure the various properties of light, a subset of our entire line of photonics products. Thorlabs offers an extensive selection of instruments that measure the properties of light. Our versatile power and energy meters can be used with over 25 different sensors in order to make NIST-traceable power and energy measurements. If the convenience of a meter is not desired, our selection of detectors includes basic photodiodes (uncalibrated and calibrated), photodetectors (biased, amplified, and avalanche), CCD and CMOS arrays, position detectors, integrating spheres, and photomultiplier tubes. The Beam Characterization category contains beam profilers (camera and scanning slit), a wavefront sensor, spectrometers, and interferometers, while the Polarimetery link leads to a selection of instruments used to measure and control the polarization of light.
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Light Meters
LXP-10B
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The new LXP digital light meter family allows for a very precise measurement of illuminanace. Thanks to very high resolution (resolution 0.01 lx ) allows for escape route emergency light measurement. All of three light meter have built-in memory for measurement result storing, and additional function making work much easier.
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Light Meter
2330 LX
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Standard Electric Works Co., Ltd
Wide range for measurements up 40000 lux and 4000 fc.. 0.01 lux and 0.001 fc resolution for accurate low light level measurements. Light sensor cover is included for preserving sensor life. Auto off function. Data hold function. Low battery indication. Over range indication. Auto-ranged. Manual-ranged. Calibration mode is provided. 9V battery system. Selection key for lux and fc. The spectral sensitivity close to CIE photopic curve. Ideal tool for workplace, clean-room and computer room light testing. Video, photographic, office, classroom, and architectural uses.
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Light Sources
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Fiber optic light sources are a low-cost way to analyze and identify accurate fiber optic readings, while certifying optical fiber. Receive the ability to measure fiber optic light continuity, loss, and quality of the signal.
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Light Control Processors
CueServer
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Interactive Technologies, Inc.
CueServer is a unique lighting control solution. At it's heart, it's an Ethernet-based lighting console with all of it's controls accessible via easy to use built-in web pages. Additionally, CueServer is a powerhouse of stand-alone architectural and show control features that can be mixed together to produce elaborate playback systems.CueServer is perfect for many lighting control applications, such as LED displays, architectural lighting, retail projects, museum attractions, theme parks, trade show exhibits, sign animation, churches, water fountains and much more. CueServer easily scales from the smallest single-fixture project to large-scale networked solutions.
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Product
Safety Light Curtains
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Type 4 (IEC 61496) safety light curtains at Type 2 pricingReliable protection of hazardous areasShort and long range selectable via wiringNo dead space when mounted in in L shapeIndustry standard M12 connection for simple wiring
