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Scanning Electron Microscopy
surface imaging from 1 to 5 nm in size.
See Also: Scanning Electron Microscopes, SEM
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Analytical Services
IGC: Inverse Gas Chromatography; Understand surface energies, polarities, acid/base properties and nanomorphology on powders and fibers. ToF-SIMS: Time-of-Flight Secondary Ion Mass Spectrometry. Localize your molecules at the first nanos! 2D imaging with resolution up to 200 nm. Highest sensitivity up to 10 ppm. CM: Quarz Crystal Microbalance In-situ observation of thickness and stiffness of any films in liquid environmentSEM: Scanning Electron Microscopy Images say more than words, especially with an artistic eye XPS/ESCA: X-ray Photoelectron Spectroscopy/Electron Spectroscopy for Chemical Analysis.
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Scanning Electron Microscopy
SEM
Materials Evaluation and Engineering
JEOL JSM-6610 LV LaboratoryScanning electron microscopy (SEM) uses electrons for imaging to obtain higher magnifications and greater depth of field than light microscopes. The instruments at MEE are capable of variable-pressure, or low vacuum, SEM (VPSEM), as well as traditional high-vacuum conditions for sample observation. VPSEM is a specialized method using a variable-pressure sample chamber that allows direct evaluation of samples that are not readily examined with a traditional high-vacuum SEM. Nonconductive or vacuum sensitive samples that would typically require additional sample preparation can be directly analyzed in VPSEM without the need for additional sample preparation, such as carbon or metallic conductive coatings. This reduces both sample preparation time and distractions in microanalysis. Our laboratory also has a field emission SEM (FESEM) for critical high-magnification work and low-voltage (LVSEM) applications. Each instrument has a spacious sample chamber that can accommodate large and irregularly-shaped specimens and accessories for feature dimensional analysis and chemical microanalysis.
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Microscopy
Microscopy is the technical field of using microscopes to view objects and areas of objects that cannot be seen with the naked eye. There are three well-known branches of microscopy: optical, electron, and scanning probe microscopy, along with the emerging field of X-ray microscopy.
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Sputter Coater & Freeze Fracture Solutions
To obtain high-quality images of samples with scanning (SEM) or transmission electron microscopy (TEM), your samples need to be conductive to avoid charging. If a sample does not have a high enough conductivity, then you can quickly cover it with a conductive layer using the method of sputter coating. Also, a carbon or e-beam evaporator coating can be used. Such coatings protect the sample, allow enhancing of the EM image contrast, or can act as a TEM-grid support film for small scale samples.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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Scanning Electron Microscopy (SEM Analysis)
Rocky Mountain Laboratories, Inc.
Scanning Electron Microscopy (SEM Analysis) can produce images of almost any sample at magnifications of 15-300,000X. The SEM has tremendous depth of field allowing for imaging that cannot be accomplished using optical microscopy. Conductive and nonconductive samples can be imaged. When operated in the backscatter (BSE) detection mode, differences in material composition can be observed. Elemental analysis can be performed on any feature observed with an integrated Energy Dispersive Spectroscopy (EDS) detector.
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TEM Lamella Preparation And Volume Imaging Under Cryogenic Conditions
ZEISS Correlative Cryo Workflow
ZEISS Correlative Cryo Workflow connects widefield, laser scanning, and focused ion beam scanning electron microscopy in a seamless and easy-to-use procedure. The solution provides hardware and software optimized for the needs of correlative cryogenic workflows, from localization of fluorescent macromolecules to high-contrast volume imaging and on-grid lamella thinning for cryo electron tomography.
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Cross Sections and Metallography
Rocky Mountain Laboratories, Inc.
Cross sections are prepared by mounting samples in epoxy and then grinding and polishing the mount for imaging in the optical microscope or Scanning Electron Microscopy (SEM). Valuable information from cross sectioning can include: film thicknesses, inclusions, corrosion thickness, dimensional verification, and subsurface defects. Metallographic cross sections are typically etched to reveal the microstructure. Microstructural analysis can provide information about heat treatment history, corrosion susceptibility, as well as undesirable microconstituents.
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X-Ray Photoelectron Spectrometer
AXIS Supra
AXIS SupraTM is an X-ray photoelectron spectrometer (XPS) with unrivalled automation and ease of use for materials surface characterisation. The patented AXIS technology ensures high electron collection efficiency in spectroscopy mode and low aberrations at high magnifications in parallel imaging mode. XPS spectroscopy and imaging results can be complemented by additional surface analysis techniques such as: ultraviolet photoemission spectroscopy (UPS); Schottky field emission scanning Auger microscopy (SAM) and secondary electron microscopy (SEM) and ion scattering spectroscopy (ISS). The AXIS Supra replaces the AXIS Ultra DLD as Kratos' flagship x-ray photoelectron spectrometer.
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Scanning Electron Microscope
Verios G4 XHR SEM
The Thermo Scientific™ Verios G4 scanning electron microscope (SEM) provides sub-nanometer resolution from 1 to 30 kV and enhanced contrast needed for precise measurements on materials in advanced semiconductor manufacturing and materials science applications, without compromising the high throughput, analytical capabilities, sample flexibility and ease of traditional Scanning Electron Microscope (SEM).
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Scanning Electron Microscope
E5620
The E5620 is a MASK DR-SEM(∗) product for reviewing and classifying ultra-small defects in photomasks and mask blanks. It implements Advantest’s highly stable image capture technology to easily import defect location data from mask inspection systems and automatically image the locations. Compared to the E5610, our predecessor DR-SEM system, the E5620 features a number of improvements designed specifically to target mask requirements for extreme ultraviolet (EUV) lithography.
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Scanning Electron Microscope
SEM
Delivers the world's best resolution with the incorporation of the newly-developed, super-high resolution Gentle Beam (GBSH). In addition, the maximum probe current of the In-lens Schottky Plus gun has been increased from 200 nA to 500 nA.
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Scanning Electron Microscopes
SEM
Scanning Electron Microscopes (SEM) scan a sample with a focused electron beam and obtain images with information about the samples’ topography and composition.
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Scanning Electron Microscope
JSM-IT510
Scanning electron microscopes (SEMs) are indispensable tools not only for research but also for quality assurance and manufacturing sites.At those scenes, the same observation processes need to be performed repeatedly and there has been a need to improve the efficiency of the process.
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Scanning Electron Microscope w/ EDX Laboratory
Trialon has the equipment and experienced staff to operate this highly technical piece of laboratory equipment. Our state-of-the-art materials analysis lab located in Auburn Hills, MI is managed by a Ph.D with over 20 years of hands-on experience in root cause failure analysis of design, material and process for current and future products.
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Cathodoluminescence Solutions for Electron Microscopy
CLUE Series
HORIBA Scientific's Cathodoluminescence Universal Extension enhances any SEM’s analytical capabilities while maintaining its original functionality. Since the sample is able to remain in the same spot, CLUE can easily be combined with other microscopy applications, such as EDS and EBIC.
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Scanning Probe Microscopy/Atomic Force Microscopy (SPM/AFM Analysis)
Rocky Mountain Laboratories, Inc.
Scanning probe microscopy (SPM) refers to a family of measurement techniques that utilize a scanning probe. The most common measurement is Atomic Force Microscopy (AFM Analysis), which measures surface topography. Imaged areas can be from the nm scale to as large as 100 µm X 100 µm. Heights and depths of features can be measuredand many surface roughness parameters, e.g Ra, can be calculated. 3-D images can also be produced for dramatic data presentation. Magnetic and electrical response can also be measured with SPM.
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Correlative Microscopy
Our modular software platforms enable you to acquire, process and analyze images in multiple dimensions and over various timepoints
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Electron Multipliers
Electron multipliers are mainly used as positive/negative ion detectors. They are also useful for detecting and measuring vacuum UV rays and soft X-rays. Hamamatsu electron multipliers have a high gain (multiplication factor) yet low dark current, allowingoperation in photon counting mode to detect and measure extremely small incoming particles and their energy. This means our Hamamatsu electron multipliers are ideal for electron spectroscopy and vacuum UV spectroscopy such as ESCA (electron spectroscopy for chemical analysis) and Auger electron spectroscopy as well as mass spectroscopy and field-ion microscopy.
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Electron Microscope Analyzer
QUANTAX EDS for TEM
Long standing expertise in EDS ensures the configuration of the best solution for your specific microscope (STEM, TEM or SEM) thanks to slim-line detector design and geometrical optimization for each microscope pole piece and EDS flange type
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Scanning Probes
Scanning probes can acquire several hundred surface points each second, enabling measurement of form as well as size and position.
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Electron Microscope Analyzer
QUANTAX FlatQUAD
QUANTAX FlatQUAD is the EDS microanalysis system based on the revolutionary XFlash® FlatQUAD. This annular four-channel silicon drift detector is inserted between SEM pole piece and sample, achieving maximum solid angle in EDS.
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Fluorescence Microscopy Solutions
Bruker’s suite of fluorescence microscopy systems provides a full range of solutions for life science researchers. Our multiphoton imaging systems provide the imaging depth, speed and resolution required for intravital imaging applications in neuroscience, oncology and immunology.
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Nanoscale Microscopy Standards
The nanoscale AFM-CD standard (CD, critical dimension) contains structures to calibrate line widths and periods of AFM (atomic force microscopy) devices.
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Electron Probe Microanalyzer
JXA-8530FPlus
JEOL commercialized the world's first FE-EPMA, the JXA-8500F in 2003. This highly regarded FE-EPMA has long been used in various fields, such as: metals, materials and geology in both industry and academia. The JXA-8530FPlus is a third-generation FE-EPMA that comes with enhanced analytical and imaging capabilities. The In-Lens Schottky field emission electron gun combined with new software provides higher throughput while maintaining high stability, thus allowing a wider range of EPMA applications to be achieved with higher resolution.
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Electron Microscope Analyzers
Bruker’s electron microscope analyzers EDS, WDS, EBSD and Micro-XRF on SEM offer the most comprehensive compositional and structural analysis of materials available today. The full integration of all these techniques into the ESPRIT software allows you to easily combine data obtained by these complementary methods for best results.
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Real-Time X-Ray Imaging and Variable Pressure Scanning Electron Microscope
Trialon has the equipment and experienced staff to operate this highly technical piece of laboratory equipment. Our state-of-the-art materials analysis lab located in Auburn Hills, MI is managed by a Ph.D with over 20 years of hands-on experience in root cause failure analysis of design, material and process for current and future products.
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Imaging Scanning Monochromator
H1034
HORIBA Scientific OEM has developed a high-throughput imaging scanning monochromator based on an aberration-corrected concave holographic grating with low stray light and high efficiency. This proprietary layout with single optics design is ideal for imaging for low-light applications. It features a 3-position external filter wheel, TTL drive electronics, 4-phase stepper motor and associated worm/gear 90:1 ratio mechanism, encoded, aligned and focused at factory.
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Scanning Probe Microscopy
SPECS Surface Nano Analysis GmbH
As Scanning Probe Microscopy (SPM) is a key tool for nanotechnology, SPECS offers dedicated solutions for highly demanding requirements.In UHV, strong emphasis lies on spectroscopic methods such as scanning tunneling spectroscopy and inelastic tunneling spectroscopy as well as single atom and molecule manipulation. With the invention of a Joule-Thomson cryostat by Prof. Wulf Wulfhekel, SPECS now offers the JT-STM , operating sample and sensors in thermal equilibrium below 1K with optional high magnetic field.
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Renishaw Scanning Probes
Advanced Industrial Measurement Systems
The REVO® is designed to maximize CMM throughput while maintaining high system accuracy and uses synchronized motion as well as Renscan5 measurement technology to minimize the dynamic effects of CMM motion at ultra high measurement speeds. This is achieved by letting the REVO® head do the fast demanding motion while the CMM moves in a slow linear fashion.
