Inductively Coupled Plasma
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Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Emission Spectroscopy
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Inductively Coupled Plasma Optical Emission Spectrometer
EXPEC-6000
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An analytical technique used to determine how much of certain elements are in a sample.
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Inductively Coupled Plasma Mass Spectrometry / ICP-MS Systems
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Agilent ICP-MS systems utilize innovative technology to deliver excellent sensitivity, accuracy, ease of use and productivity. Our 7800 and 7900 quadrupole ICP-MS systems offer the highest matrix tolerance, widest dynamic range and most effective interference removal for trace elements across most typical applications. The 8900 Triple Quadrupole ICP-MS (ICP-QQQ) adds MS/MS operation, providing precise control of reaction cell processes to ensure the most consistent and accurate results, resolving interferences that are beyond the capability of quadrupole and sector-field high resolution ICP-MS.
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Inductively Coupled Plasma
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Inductively Coupled Plasma Techniques can be very powerful tools for detecting and analyzing trace and ultra-trace elements. Over the past years, ICP-MS has become the technique of choice in many analytical laboratories for providing the accurate and precise measurements needed for today’s demanding applications and for providing required lower limits of detection.
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Inductively Coupled Plasma Spectroscopy (ICP-OES/MS), ICP Analysis Services
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ICP-OES measures the light emitted at element-specific characteristic wavelengths from thermally excited analyte ions . This light emitted is separated and measured in a spectrometer, yielding an intensity measurement that can be converted to an elemental concentration by comparison with calibration standards. ICP-MS (ICP-Mass Spec) measures the masses of the element ions generated by the high temperature argon plasma. The ions created in the plasma are separated by their mass to charge ratios, enabling the identifcation and quantitation of unknown materials. ICP-MS offers extremely high sensitivity (i.e. low detection limits) for a wide range of elements
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Inductively Coupled Plasma Mass Spectrometer
ICPMS-2030
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With its newly developed collision cell and optimized internal structure, the ICPMS-2030 provides superior sensitivity. At the same time, thanks to the adoption of its proprietary mini-torch unit and provision of an Eco mode, the quantity of argon gas needed for analyses has been greatly reduced to the industry's lowest levels. As a result, low running costs are assured. The Development Assistant function of the software automatically sets the optimal analysis conditions for quantitative analysis. Then, after measurements are complete, the Diagnosis Assistant function automatically checks the validity of the necessary data. While reducing the burden on the user, the efficiency of analyses is enhanced and the reliability of the data can be increased. It complies with FDA 21 CFR Part 11.
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Chemical Analysis and Corrosion Testing
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Performing chemical analysis of metal alloys including both ferrous and non-ferrous alloys.Chemical analysis involves determining the chemical constituents of metals and related materials.An industry leader and co-operating laboratory for qualifying Calibration Standards for Chemical Analysis.Our chemical laboratory processes include Spectroscopy – Optical Emission Inductively Coupled Plasma, gas analysers, wet chemical, Intercrystalline/ Intergranular Corrosion (including G28, G48 etc).
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Inductively Coupled Plasma Spectrometry
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Is an analytical technique that can be used to measure elements at trace levels in biological fluids.
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Inductively Coupled Plasma Optical Emission Spectroscopy / ICP-OES Systems
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Industry-leading performance, speed and ease of use – no compromises
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ICP Plasma System
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The AXIC IsoLok® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing. The system is based on a modular design starting with a universal chamber and cabinet unit with ICP etch or deposition bottom electrodes available for easy installation into the chamber unit combined with a load-lock. We are confident you will find the ease of use, variety of plasma processes, serviceability and attractive pricing unsurpassed by any other plasma product in the market.
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Product
Threaded Coupling Adapter, G2, G6, G10, ITA, For Conduit Harnessing Assemblies/Clamps
410112599
Coupling Adapter
The Adapter is designed to accommodate military and commercial circular backshells for conduit or strain relief when designing for general and heavy-duty applications. The male thread size is 1.625-18 for this application.
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Inductive Sensors
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Inductive sensor designed to detect shaft speed, shaft position, gate position, or object presenceTotally sealed constructionMulti-voltage 24 - 240 VAC/VDCDetects ferrous targets up to 5/16" (8 mm)IP 65 Protection
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Inductive Heater
BD-1.01
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The device is assigned to heat the bars to the state, which allows upsetting. The DB-1.01 heater characterizes especially high watt-hour efficiency (bigger than 98%) thanks to suitable concentration of electromagnetic field in the heating zone of inductor (the solution secured by patent). It is possible to addapt the nductive heater BD-1.01 for heating any others bars.
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Inductive Sensor
HFCT Ø 30-39-50mm
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Techimp HFCT is an inductive sensor for partial discharge measurements. It is suitable for on/off line PD tests on many electrical systems (cables, transformers, rotating machine, etc..). It has to be applied to the ground connection of the system to be tested.
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Versatile AFM Optical Coupling
TRIOS
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The TRIOS platform is an advanced research instrument that provides the entry path for researchers in materials science, biology, spectroscopy and photonics. TRIOS is the most versatile optical coupling platform providing three ports for optical spectroscopy measurements with top-down, side (oblique) and inverted accesses to the AFM tip and sample.If you work with opaque and/or transparent samples, either in air or in liquid looking at nanoscale structures and near-field optical properties investigation, the TRIOS platform is the right solution for you. It perfectly combines upright optical, inverted optical, and atomic force microscopies, and unleash all the power of both techniques providing instrument adjustment and measurement automation, high resolution and integration flexibility. Such performance is only available from HORIBA.
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Inductance Capacitance Meters
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A piece of electronic test equipment used to measure capacitance, mainly of discrete capacitors.
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Plasma Process Monitors
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Plasma process monitors to monitor plasma emissions during semiconductor manufacturing processes such as etching, sputtering and CVD.
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Unclamped Inductive Load Tester
ITC55300C
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Model ITC55300C performs ruggedness testing of power MOSFETs, discretes and modules and IGBTs, discretes and modules. It also tests single and dual diodes, and forward and reverse bias of IGBTs when used with an optional ITC55-RSF Output Selector Box.
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Inductive Sensors
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Our hygienic sensors are extremely durable against abrasive and aggressive media: their labeling is resistant to abrasion and chemicals. The luminous displays are protected against destruction and the housing construction is optimized for safe cleaning.
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Time-domain Field-Device-Circuit coupled simulator
EM-SUPREME®
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Time-domain Field-Device-Circuit coupled simulator for modeling of passive structures, active components, and complete RF & millimeter-wave modules. EM-Supreme is used for EM modeling of power amplifiers, switches, filters, active antennas, and complete RF modules such as antenna-switch, switch-filter, switch-filter-amplifier, and front-end modules with no approximations.
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RF Plasma Generators
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Choose from a broad range of RF plasma generators and access unique features for configuration, control, and application requirements. From various mounts and sizes to full digital control and plasma dynamic response, our RF generators can ignite your process innovation.
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Coupling Decoupling Networks (CDN)
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Beijing KeHuan Century EMC Technology Co,.LTD
Beijing KeHuan Coupling Decoupling Networks (CDN)
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Inductive Sensors
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Wide operating temperature range. High protection rating for the requirements of harsh industrial environments. Reliable detection due to low sensor tolerances. Reduced inventory due to wide range of applications.
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Inductive Proximity Sensors (Round)
SP1
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● Easy installation, high-speed pulse generator, high-speed rotation control, and more.● A wealth of models ideal for limit control, counting control, and other applications.● Sensing distance from 0 ~ 4 ~ 6/ ~ 20mm● Housing by PBT with strong structure and acid resisting.
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Remote Plasma Source
MAXstream
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Advanced Energy’s MAXstreamTM line is the next generation of remote plasma sources for chamber cleaning. The MAXstream is available in 3, 6, 8, 10, and 12 SLPM NF3 flow rates to optimize price and performance.
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Cylindrical Inductive Proximity Sensor
GX-M SERIES
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Panasonic Industrial Devices Sales Company of America
The GX-M Series line of Cylindrical Inductive Sensors offer models with a wide range of sensing distances that are available with shielded or non-shielded 2, and 3 wiring configurations.
