Photo Mask
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Tabletop Mask Aligner
Model 200
The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography capital equipment industry. The Model 200 is a tableop mask Aligner that requires minimal cleanroom space. It offers an economic alternative for R&D, or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.
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Tabletop Front & Backside Mask Aligner
Model 200IR
The OAI Model 200IR Mask Aligner is a tabletop system that requires minimal clean room space. It is a cost-effective alternative for R&D or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment precision. It has an alignment module which features mask insert sets and quick-change wafer chucks that enable the use of a variety of substrates and masks without requiring tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and z-axis.
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Photo Detector Testing
With the rise of 5G technology and popularization mobile devices, more and more advanced photoelectric sensors are used in our daily lives. In order to be better applied to mobile devices, the photosensitive area of these advanced photodetector is getting smaller and smaller. However, these applications place higher and higher requirements on the light sensing performance of advanced photodetectors. In the process of shrinking the photosensitive area, it also brings the challenge of accurate measurement of quantum efficiency. Enlitech adopts the spatial light homogenizing technology and follows the ASTM standard “Irradiance Mode” test method, which is proven that it can accurately perform quantum efficiency and other key parameter measurements of advanced photodetectors.
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Large Photo Signal Generator
DDS9m
170MHz 4-Channel Signal Generator. The DDS9m generates four independent, phase synchronous sine wave output signals and is programmable in 0.1Hz steps from 0.1Hz to 171MHz. Programming is via an RS232 serial interface. Phase is 14-bit programmable and amplitude is 10-bit programmable. The DDS9m is accurate to 1.5ppm when using the on board TCXO timebase or you can use an external timebase. It requires 3.3 VDC power. SOF8_409 windows software is available as an extra cost accessory.
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Photo Optic Sensors
From patient monitoring in hospitals, to wearables and home healthcare applications, TE Connectivity (TE) offers photo optic sensors and components for non-invasively measuring blood oxygenation (SpO₂) level. With more than 27 years of proven reliability and expertise, TE has designed SpO2 sensors with best-in-class flexibility to accommodate multiple wavelength options. Our ability to provide both components and complete sensor packages make us the leading choice for pulse oximetry applications that require high degrees of precision, durability and performance.
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Custom Solutions for Mask Aligners
OAI offers custom designed solutions built to your unique specification.
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Medical Masks Flammability Tester
TF361
TESTEX Testing Equipment Systems Ltd.
Medical Masks Flammability Tester is used to test the flammability of medical masks, to ensure the safety of masks to wear in. Medical Masks Flammability test Chamber complies with EN 149, GB 2626, GB 19083.
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MRM(Mask)
MRM Series
- Fully automated system that can produce masks by automating the mask production process such as fabric supply, molding, cutting, and bonding.
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Bounded Output Mask
The bounded output mask provides a means of ensuring that measurements of TI according to IEC 62359 can satisfy the requirement of only determining the ultrasonic output through an area of 1 cm x 1 cm.
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Mask Produce and Test Machine
LISUN produce the bfe tester for face mask, pfe tester, melt-blown cloth electrostatic electret generator according to ASTM F1862-17, ASTM F2299-03 (2017), ASTM F2100-2019, BS EN14683-2019, BS EN 14387-2004+A1 2008, BS EN 136-1998, BS EN 140-1999, BS EN 143-2000 +C1-A1, BS EN 149-2001+A1
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MASK MVM-SEM® E3600 Series
E3650
Amid the progress of multiple-exposure technology, and the development of finer-pitch and more complicated circuits, as well as increases in the number of masks and the number of measurement points on each mask, the size of wiring patterns formed on photomasks needs to be measured and evaluated stably with high precision. Advantest’s E3600 series meets the needs of state-of-the-art devices with high measurement repeatability and stable throughput.
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Front & Backside, Semi-Automatic Mask Aligner
Model 800E
The OAI Model 800E front and backside, semi-automatic mask aligner system offers advanced features and specifications found most often in costly automated production mask aligners. With the development of this mask aligner, OAI meets the growing challenge of the dynamic semiconductor and MEMS market with a new class of mask aligners that are engineered for R&D and low volume production.
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Mask Flatness Measurement System
Tropel® UltraFlatTM 200 Mask System
The Tropel® UltraFlatTM 200 Mask System was designed specifically for the photomask industry. It delivers the lowest measurement uncertainty for ever-tightening mask flatness specifications. Shrinking device features require not only flatter wafers, but flatter masks.
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Phase Masks
Phase masks are the production tool used to write gratings in fibers and waveguides. Ibsen Phase masks incorporate unbeatable, interferometric (holographic) patterning technology into a production friendly Phase mask.
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NanoLattice Pitch Standard for Mask Handling Tools (NLSM)
The NanoLattice™ (NLSM) 100 nm pitch standard utilizes gratings with near perfect periodicity to calibrate magnification and scan linearity of CD-SEM and Atomic Force Microscopes (AFM). Make the grade, with the only pitch standard of its kind available below the 130 nm node.
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Traffic Photo Enforcement
LidarCam 2
Automatically collect a video + multiple high-resolution photos every time you capture a traffic violation. Built-in Automated License Plate Recognition (ANPR/ALPR) Technology can automatically check for wanted plates or other violations. Hand-held or mounted to a tripod, in a patrol vehicle or from the side of the road, the Stalker LidarCam 2 is the next generation of photo enforcement.
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Photo Detector with Integrated Transimpedance Amplifiers
ADN3010-11
Analog Devices optoelectronic amplifiers include a range of germanium photodiodes that, through a proprietary process, have been monolithically integrated with silicon transimpedance amplifiers and limiting amplifiers. This process eliminates the need for bond wires connecting the photodiode to the transimpedance amplifier, which leads to improved performance and greater manufacturing reliability. Our portfolio of products also supports the growing need for optical and electrical interface miniaturization.
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Masks Bacterial Filtration Efficiency Tester
Sataton Instruments Technology CO., Ltd
Face Masks bacterial filtration efficiency BFE tester is to determine the bacterial filtration efficiency (BFE) of medical face mask materials by employing a ratio of the upstream bacterial challenge to downstream residual concentration of the tested medical face mask materials. The tester provides certain flow rate of bacterial aerosol. The operator can measure the number of colony forming units passing through the medical face mask material, which is clamped between a six-stage Anderson cascade impactor and an aerosol chamber, expressed as a percentage of the number of colony forming units present in the challenge aerosol.
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Masks Synthetic Blood Penetration Tester
Sataton Instruments Technology CO., Ltd
Medical face masks synthetic blood penetration resistance tester is to evaluate the penetration – splash resistance property of medical face masks by the impact of a small fixed volume of a high-velocity stream of synthetic blood which is projected horizontally. The pneumatically controlled valve will simulate the splatter of blood or other body fluid to disburse at the specimen mask. The tester is suitable to determine the synthetic blood penetration of materials or certain materials used in medical face masks.
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Face Masks Particulate Filtration Efficiency PFE Tester
GLE-20
GLE-20 is an oil-salt two-in-one Face Masks Particulate Filtration Efficiency PFE Tester. According to ASTM F1862-17, ASTM F2299-03 (2017), ASTM F2100-2019, BS EN14683-2019, BS EN 14387-2004+A1 2008, BS EN 136-1998, BS EN 140-1999, BS EN 143-2000 +C1-A1, BS EN 149-2001+A1, etc. It is used to test the particulate filtering efficiency of daily protective masks and medical masks, and to determine the obstruction performance of ordinary fabrics and medical protective masks against a constant flow of airflow.
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Photo Gate Logger Sensor
NUL-209
This sensor can be used to study various kinds of motion. With six modes of operation, time, velocity or acceleration can be measured with one or two photo gates and associated timing cards, as well as showing pictorially the status (digital 1 or 0) of the voltage output of the photo gate as timing cards pass through it.
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Medical Masks Differential Pressure Tester
Sataton Instruments Technology CO., Ltd
Medical face mask differential pressure tester also called mask breathility tester is to determine the breathability of medical face mask materials. The tester can measure the differential pressure (Delta P) required to draw air through a measured surface area at a constant air flow rate is used to measure the air exchange pressure of the medical face mask materials. By providing the suction air through the holding sample, the tester can measure the Delta P by differential pressure transducer. It is to determine the air permeability and using comfort of the materials for medical mask.
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MASK MVM-SEM® E3600 Series
E3640
Ongoing semiconductor process shrinks are driving new demand for stable, highly precise measurement of pattern dimensions for photomask and wafer production. The E3640 satisfies these requirements with industry-leading precision measurement capabilities and upgraded functionality that enhances mask R&D and production efficiency.
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Photo Detectors
Our photo detectors are offered for both power or energy measurements. Measure as low as a few femtojoules in energy or a few picowatts in power, thanks to our highly sensitive sensors and performant electronics.
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Mask UV Sterilizers
UV-MASK
Mask UV Sterilizer applies to sterilizing the surface of masks, protective clothing, food, toys and other objects. It is widely used in hospitals, food, tea food and beverage processing and packaging equipment, food factories, cosmetics factories, dairy factories, breweries, beverage factories, bakeries and refrigerators, etc.
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Medical Mask Gas Exchange Pressure Difference Tester
DRK371
Shandong Drick Instruments Co., Ltd.
It is used to measure the gas exchange pressure difference of medical surgical masks and other products.
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Automated Front & Backside Mask Aligner System
Model 6000
With over 4 decades of manufacturing in the semiconductor industry, OAI meets the growing challenge of a dynamic market with an elite class of production photolithography equipment. Built on the proven OAI modular platform, the Model 6000 has front and backside alignment that is fully automated with a submicron printing capability as well as submicron top to bottom front side alignment accuracy which delivers performance that is unmatched at any price. Choose either topside or optional backside alignment which uses OAI’s customized advanced recognition pattern software. These Mask Aligners have OAI’s Advanced Beam Optics with better than ±3% uniformity and a throughput of 200 wafers per hour in first mask mode, which results in higher yields. The Series 6000 can handle a wide variety of wafers from thick and bonded substrates (up to 7000 microns), warped wafers (up to 7 mm-10mm), thin substrates (down to 100 micron thick), and thick photo resist.
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Mask Treatment Process
Model 100MT
OAI offers a unique process which extends the life of your mask, says good bye to tedious washing and drying of mask and thus enables your mask aligner to have increased productivity at the lowest cost of ownership. The Model 100 MT is a 2 step process.
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MASK MVM-SEM® E3600 Series
E3630
Together with the miniaturization of semiconductors, high-accurate and stable measurement and evaluation is needed for circuit patterns such as mask patterns and holes. Advantest's E3600 series are used by a wide variety of companies, from semiconductor manufacturers to photomask makers to device and materials producers.
