SEM
surface imaging from 1 to 5 nm in size.
See Also: Scanning Electron Microscopy, Scanning Electron Microscopes, EBSD
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Metrology/SEM
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Our SEM products use scanning electron microscope technology to measure and review tiny surface structures such as photomask etching and circuitry on wafers with high precision and stability.
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Scanning Electron Microscopy
SEM
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Materials Evaluation and Engineering
JEOL JSM-6610 LV LaboratoryScanning electron microscopy (SEM) uses electrons for imaging to obtain higher magnifications and greater depth of field than light microscopes. The instruments at MEE are capable of variable-pressure, or low vacuum, SEM (VPSEM), as well as traditional high-vacuum conditions for sample observation. VPSEM is a specialized method using a variable-pressure sample chamber that allows direct evaluation of samples that are not readily examined with a traditional high-vacuum SEM. Nonconductive or vacuum sensitive samples that would typically require additional sample preparation can be directly analyzed in VPSEM without the need for additional sample preparation, such as carbon or metallic conductive coatings. This reduces both sample preparation time and distractions in microanalysis. Our laboratory also has a field emission SEM (FESEM) for critical high-magnification work and low-voltage (LVSEM) applications. Each instrument has a spacious sample chamber that can accommodate large and irregularly-shaped specimens and accessories for feature dimensional analysis and chemical microanalysis.
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CD-SEM
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Our CD-SEM tools measure the width, height, sidewall angle, etc. of wiring patterns on semiconductor photomasks and wafers.
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X-Ray Photoelectron Spectrometer
AXIS Supra
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AXIS SupraTM is an X-ray photoelectron spectrometer (XPS) with unrivalled automation and ease of use for materials surface characterisation. The patented AXIS technology ensures high electron collection efficiency in spectroscopy mode and low aberrations at high magnifications in parallel imaging mode. XPS spectroscopy and imaging results can be complemented by additional surface analysis techniques such as: ultraviolet photoemission spectroscopy (UPS); Schottky field emission scanning Auger microscopy (SAM) and secondary electron microscopy (SEM) and ion scattering spectroscopy (ISS). The AXIS Supra replaces the AXIS Ultra DLD as Kratos' flagship x-ray photoelectron spectrometer.
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Field Emission SEM
FESEM
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Materials Evaluation and Engineering
The FESEM is an advanced microscope offering increased magnification and the ability to observe very fine features at a lower voltage than the SEM found in most laboratories.
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Scanning Electron Microscopes
SEM
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Scanning Electron Microscopes (SEM) scan a sample with a focused electron beam and obtain images with information about the samples’ topography and composition.
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Ion Beam Milling Systems
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When material specimen surfaces are prepared for SEM or incident light microscopy, the specimen usually undergoes multiple processes until the layer or surface to be analyzed is machined with precision. Leica Microsystems’ workflow solutions for solid state technology cover all steps required for demanding high-quality sample preparation.
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Electron Microscope Analyzers
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Bruker’s electron microscope analyzers EDS, WDS, EBSD and Micro-XRF on SEM offer the most comprehensive compositional and structural analysis of materials available today. The full integration of all these techniques into the ESPRIT software allows you to easily combine data obtained by these complementary methods for best results.
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Cross Sections and Metallography
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Rocky Mountain Laboratories, Inc.
Cross sections are prepared by mounting samples in epoxy and then grinding and polishing the mount for imaging in the optical microscope or Scanning Electron Microscopy (SEM). Valuable information from cross sectioning can include: film thicknesses, inclusions, corrosion thickness, dimensional verification, and subsurface defects. Metallographic cross sections are typically etched to reveal the microstructure. Microstructural analysis can provide information about heat treatment history, corrosion susceptibility, as well as undesirable microconstituents.
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Energy Dispersive X-Ray Spectroscopy (EDS)
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Rocky Mountain Laboratories, Inc.
Energy Dispersive Spectroscopy (EDS Analysis) is used in conjunction with the Scanning Electron Microscope (SEM) providing chemical analysis in areas as small as 1 µm in diameter. EDS detects all elements except for H, He, Li, and Be. EDS can be performed exactly on any features or particles seen in the SEM images and can “MAP” elements on a surface. Unknown materials can be identified and quantitative analysis can be performed.
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Atomic Force Microscope for SEM/FIB
AFSEM® AFM Insert
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AFSEM is an atomic force microscope (AFM), designed for integration in a SEM or Dualbeam (SEM/FIB) microscope. Its open access design allows you to simultaneously operate SEM and AFM inside the SEM vacuum chamber. The correlated image data of AFM and SEM enable unique characterization of your sample, and the combination of complementary techniques is a key success factor for gaining new insights into the micro and nano worlds. AFSEM enables you to easily combine two of the most powerful analysis techniques to greatly extend your correlative microscopy and analysis possibilities.
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Saluki CSA Series Signal Analyzer (Modular)
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Saluki CSA series signal analyzer reaches the frequency from 100 kHz to up to 26.5 GHz with a maximum of 40 MHz analysis bandwidth. It can test signal power, frequency, phase, P-1, TOI, OBW, channel power, spurious, ACPR, CCDF, SEM, EVM, and other indicators. It can be used independently or combined with the chassis to form a test system.
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Saluki CSA-M Series Signal Analyzer (Benchtop)
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Saluki CSA-M series benchtop signal analyzer reaches the frequency from 100 kHz to up to 26.5 GHz with a maximum of 40 MHz analysis bandwidth. It can test signal power, frequency, phase, P-1, TOI, OBW, channel power, spurious, ACPR, CCDF, SEM, EVM, and other indicators.
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Scanning Electron Microscope (SEM)
Prisma E
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Prisma E scanning electron microscope (SEM) combines a wide array of imaging and analytical modalities with new advanced automation to offer the most complete solution of any instrument in its class. It is ideal for industrial R&D, quality control, and failure analysis applications that require high resolution, sample flexibility and an easy-to-use operator interface. Prisma E succeeds the highly successful Quanta SEM.
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MASK DR-SEM
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Our defect review SEM tools perform detailed reviews of minute defects on photomasks.
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Scanning Electron Microscope
Verios G4 XHR SEM
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The Thermo Scientific™ Verios G4 scanning electron microscope (SEM) provides sub-nanometer resolution from 1 to 30 kV and enhanced contrast needed for precise measurements on materials in advanced semiconductor manufacturing and materials science applications, without compromising the high throughput, analytical capabilities, sample flexibility and ease of traditional Scanning Electron Microscope (SEM).
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SEM- Based Dectors
ScintiFast™
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ScintiFast™ is El-Mul’s flagship scintillator technology enabling the next generation of detectors with shorter response time and higher sensitivity. Recently released, ScintFast™ has the highest available photon yield for the nanosecond scintillator category. ScintiFast™ is the scintillator of choice for detectors in SEM-based tools for the semiconductor market as well as in Time of Flight Mass Spectrometry instruments.
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MASK MVM-SEM® E3600 Series
E3650
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Amid the progress of multiple-exposure technology, and the development of finer-pitch and more complicated circuits, as well as increases in the number of masks and the number of measurement points on each mask, the size of wiring patterns formed on photomasks needs to be measured and evaluated stably with high precision. Advantest’s E3600 series meets the needs of state-of-the-art devices with high measurement repeatability and stable throughput.
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Microscopy Software/Hardware
ZEISS Atlas 5
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Atlas 5 is your powerful hardware and software package that extends the capacity of your ZEISS scanning electron microscopes (SEM) and ZEISS focused ion beam SEMs (FIB-SEM). Use its efficient navigation and correlation of images from any source, e.g. light- and X-ray microscopes. Take full advantage of high throughput and automated large area imaging. Unique workflows help you to gain a deeper understanding of your sample.
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Scanning Electron Microscopes
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Our Scanning Electron Microscopes (SEMs) resolve features from the optical regime down to the sub-nanometer length scale.
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Magnetic Field Cancelling System
MR-3
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3-axis magnetic field cancelling system for electron microscopes (SEM and TEM), electron and ion beam experiments, nanotechnology, biomagnetic investigations, etc. High reliability through rugged analog design. No tedious programming, no chrashs. More than 1000 MR-3 systems sold worldwide.
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Electron Microscope Analyzer
QUANTAX Micro-XRF
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Micro-X-ray Fluorescence (Micro- XRF) spectroscopy analysis is a complementary non-destructive analytical technique to traditional Energy Dispersive Spectroscopy (EDS) analysis using a Scanning Electron Microscope (SEM).
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Spectroscopic Platform
Allalin
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The Allalin is a nanometer resolution spectroscopy instrument, based on a disruptive technology known as quantitative cathodoluminescence that integrates a light microscope and a scanning electron microscope (SEM) into one tool.
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Sputter Coater & Freeze Fracture Solutions
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To obtain high-quality images of samples with scanning (SEM) or transmission electron microscopy (TEM), your samples need to be conductive to avoid charging. If a sample does not have a high enough conductivity, then you can quickly cover it with a conductive layer using the method of sputter coating. Also, a carbon or e-beam evaporator coating can be used. Such coatings protect the sample, allow enhancing of the EM image contrast, or can act as a TEM-grid support film for small scale samples.
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MASK MVM-SEM® E3600 Series
E3630
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Together with the miniaturization of semiconductors, high-accurate and stable measurement and evaluation is needed for circuit patterns such as mask patterns and holes. Advantest's E3600 series are used by a wide variety of companies, from semiconductor manufacturers to photomask makers to device and materials producers.
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Stand alone Software
MeX
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MeX is a stand alone software package that turns any SEM with digital imaging into a true surface metrology device. Using stereoscopic images the software automatically retrieves 3D information and presents a highly accurate, robust and dense 3D dataset which is then used to perform traceable metrology examination. The results are obtained irrespective of the SEM magnification providing metrology at macro and micro levels. No additional hardware is necessary to run MeX and it can be used with any SEM. Due to the unique AutoCalibration routine the calibration data is automatically refined. Thereby only MeX enables traceable 3D measurements at any magnification in the SEM.
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Scanning Electron Microscope
JSM-IT510
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Scanning electron microscopes (SEMs) are indispensable tools not only for research but also for quality assurance and manufacturing sites.At those scenes, the same observation processes need to be performed repeatedly and there has been a need to improve the efficiency of the process.
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MASK MVM-SEM® E3600 Series
E3640
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Ongoing semiconductor process shrinks are driving new demand for stable, highly precise measurement of pattern dimensions for photomask and wafer production. The E3640 satisfies these requirements with industry-leading precision measurement capabilities and upgraded functionality that enhances mask R&D and production efficiency.
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Magnetic Field Testing
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Response Dynamics Vibration Engineering, Inc.
As magnetic field consultants, we have been working with magnetic field issues for sensitive tools for many decades from cutting edge development of scanning electron microscopes (SEMs) to active cancellation systems for MRI tools, to site surveys for specification compliance, debugging, and tool Magnetic Field Sensitivity Testing.
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EBSD tools
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EDAX EBSD tools provide leading performance and groundbreaking technology for analyzing crystallographic microstructure, using electron backscatter diffraction in the SEM.
