Lithography
EVG’s key competencies in lithographic technology lie in the high-throughput contact and proximity exposure capabilities of its mask aligners and its newly developed, revolutionary and highly versatile maskless exposure lithography systems. These capabilities are complemented by its resist coating and resist development systems with advanced in-house process competences and hands-on development skills.
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Product
Mask Alignment Systems
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EVG’s inventions, such as the world’s first bottom-side alignment system in 1985, have pioneered and set the industry standards in both top and double-sided lithography, aligned wafer bonding and nanoimprint lithography. EVG contributes in these areas through continuous development of mask aligner product generations to augment this core lithography technology.
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Product
LITHOSCALE® Maskless Exposure Lithography Systems
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Maskless exposure lithography systems represent an entirely new product platform of EVG lithography equipment.
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Product
Resist Processing Systems
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The EVG100 series resist processing systems establish new standards in quality and flexibility for photoresist coating and developing. Designed to provide the widest range of process variations, the EVG100 series’ modularity offers spin and spray coating, developing, bake and chill modules to suit individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings. These systems can handle more than one substrate size, from 2" to 300 mm diameter, rectangle, square or even irregular shaped substrates, with no or very short tooling time. This allows the development of new devices or processes on an industrial level, which not only requires high flexibility but also controlled and repeatable processing. EVG has built up many years of spin and spray coating experience for demanding applications and incorporates this knowledge into the EVG100 series, where our process know-how can be leveraged to support our customers.
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Product
Integrated Lithography Track Systems
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Lithography track systems complete the EVG lithography product family with a fully integrated production system and high grade of automation combining mask alignment and exposure with integrated pre- and post-processing. Based on a modular platform, the HERCULES lithography track system merges EVG’s established optical mask alignment technology with integrated cleaning, resist coating, baking and resist development modules. This turns the HERCULES platform into a “one stop shop”, where pre-processed wafers are loaded into the tool and fully structured processed wafers are returned.
