OAI
OAI is a leading manufacturer of reliable, precision equipment for MEMS, semiconductors, nanotechnology, cleanroom automation, and for UV light measurement.
- 800-843-8259
408-232-0600 - 408-433-9904
- sales@oainet.com
- 464 South Hillview Drive
Milpitas, CA 95035
United States of America
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Automated Mask Aligner with Integrated Mask Changer
Model 6000A-MC
The Model 6000A-MC is a precision system combining OAI’s Model 6000, Automated Production Mask Aligner, with an integrated mask changer. The mask changer can handle from 10 to 150 masks. Ideal for both semiconductor and bio-tech applications. It also is designed with a bar code reader to assure each mask is coordinated to the right process. Please contact OAI for further product information.
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Tabletop Front & Backside Mask Aligner
Model 200IR
The OAI Model 200IR Mask Aligner is a tabletop system that requires minimal clean room space. It is a cost-effective alternative for R&D or limited scale, pilot production. Utilizing an innovative, air bearing / vacuum chuck leveling system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment precision. It has an alignment module which features mask insert sets and quick-change wafer chucks that enable the use of a variety of substrates and masks without requiring tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and z-axis.
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Single Long Pulse Solar Simulator & I-V Test System
TriSOL SLPSS
The OAI Test System for HIGH EFFICIENCY SOLAR CELLS overcomes the limitations of flash testing by providing a highly optimized pulse width and voltage sweep rate to match the cell’s dielectric response speed. As a result, the system produces extremely accurate measurements of solar cell efficiency leading to increased profitability.
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Enhanced UV Light Source
Model 30E
The Model 30E Enhanced UV Lightsource is highly efficient and may be utilized in a variety of applications. Light is collected by an ellipsoidal reflector and focused on an integrating/condensing lens array to produce uniform illumination at the exposure plane. This UV light source is available in various beam sizes up to 24 inches square with output spectra ranging from 220 nm to 450 nm, using the appropriate lamp (included). Output power ranges from 200 watts to 5 kilowatts. All OAI UV Lightsources are easily equipped with quick-change filter assemblies, enabling the user to customize the output spectrum with little effort. Optional remote exhaust fans are available.
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Solar Simulators
TriSOL CPV
Concentrating Photovoltaics (CPV) has the promise of producing solar cells with high cell efficiencies, which result in a reduction in the cost of operating a PV module. However, a CPV system requires the integration of CPV solar cells, modules and CPV optics into one efficient system. OAI’s focus is CPV cell testing methodology. The CPV cells can now be tested using OAI’s advanced standalone CPV Simulators for low dose and high dose configurations. The low dose CPV Solar Simulator provides exposure up to 50 Suns, whereas, the high dose CPV Solar Simulator provides exposure up to 1500 Suns. The low and high dose simulators provide exposure in varying Sun concentrations in various beam sizes from 1.5cm x 1.5cm to 7.5cm x 7.5cm, and may be configured with OAI’s I-V Test Systems.
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Exposure Systems
Model 2000AF & 2000SM
The OAI Model 2000 Exposure Systems may be configured as either an edge-bead exposure system (2000SM) or a flood exposure system (2000AF); both configurations are based on OAI’s proven, time-tested platform.
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Mask Treatment Process
Model 100MT
OAI offers a unique process which extends the life of your mask, says good bye to tedious washing and drying of mask and thus enables your mask aligner to have increased productivity at the lowest cost of ownership. The Model 100 MT is a 2 step process.
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UV Meters
OAI’s UV Measurement Instrumentation are the standard for Semiconductor Lithography, MEMS, Sensors, Microfluidics, UV Curing, 3-D Printing, Sterilization, Water Purification and Solar/PVC industries. For over 45 years our meters have earned a reputation for accuracy, repeatability and dependability. We offer full calibration and support services worldwide.
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DUV Mask Aligner
Model 200E
OAI’S Model 200E DUV Mask Aligner performs all the functions of the tabletop Model 200 Mask Aligner but utilizes a 185nm Excimer Lamp as the UV light source. It is used for Biotechnology Processing.
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Custom Solutions for Mask Aligners
OAI offers custom designed solutions built to your unique specification.
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Custom Solutions for UV Intensity Meters & Radiometers
OAI offers custom designed solutions built to your unique specification.
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UV Light Meter
Model 308T
Built for high intensity applications the NEW OAI Model 308T UV Light Meter is a dependable, direct-reading instrument designed for measuring UV light intensity for UV curing. The Model 308T features detachable probes for use in the UVA, UVB and UVC ranges, plus a high speed serial port. Accuracy of the meter is within ±3%and measurement repeatability is within ±3 LSB (least significant bit). Like all OAI precision instruments, the Model 308T provides NIST traceable measurements. This easy-to-use meter is auto-ranging from 0.1 to 1999.9 milliwatts/cm2 full scale when used with the 2000 milliwatts/ cm2 probe. The linearity of the meter in this range is at least ±(.002% + 6 LSB).
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UV LED Light Source
Model 32
This new UV LED lightsource is designed and engineered by the proven lithography experts at OAI. The lightsource delivers a number of unique benefits, the most consequential of which is consistent intensity over an exceptionally long life. The lightsource is highly energy efficient, requires no maintenance or light replacement, and contains no mercury.
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Light and Energy Meter
Model 656
OAI Model 656 Meter is designed for use with all mask aligners and flood exposure systems. For over 45 years, OAI is a world leader in UV Light & Energy Measurement Instrumentation used for reliable accurate calibrated control of the photolithography processes in the Semiconductor, MEMS, Wafer Packaging and Wafer Bumping Industries.
