Rigaku Corp.
Since its inception in 1951, Rigaku has been at the forefront of analytical and industrial instrumentation technology. Today, with hundreds of major innovations to their credit, the Rigaku group of companies are world leaders in the fields of general X-ray diffraction, thin film analysis, X-ray fluorescence spectrometry, small angle X-ray scattering, protein and small molecule X-ray crystallography, Raman spectroscopy, X-ray optics, semiconductor metrology, X-ray sources, computed tomography, nondestructive testing and thermal analysis.
- +81 3-3479-0618
- +81 3-3479-6171
- info-gsm@rigaku.co.jp
- 3-9-12, Matsubara-cho
Akishima-shi, Tokyo
Tokyo, 196-8666
Japan
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product
Labratory Micro-Spot XRD Residual Stress Analysus with both Iso- and Side-Inclination Methods
AutoMATE II
Residual stress may be created during the manufacturing process of a material, or it may accumulate in a structure over many years in operation. In either case, this stress can have a serious negative effect on a product's quality, durability and lifetime. Accurate detection of residual stress is an important element of the quality control process and helps predict the service lifetime of products.
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Benchtop X-ray Crystallography System
XtaLAB mini II
The Rigaku XtaLAB mini II, benchtop X-ray crystallography system, is a compact single crystal X-ray diffractometer designed to produce publication-quality 3D structures. The perfect addition to any synthetic chemistry laboratory, the XtaLAB mini II will enhance research productivity by offering affordable structure analysis capability without the necessity of relying on a departmental facility. With the XtaLAB mini II, you no longer have to wait in line to determine your structures. Instead your research group can rapidly analyze new compounds as they are synthesized in the lab.
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Benchtop X-ray diffraction (XRD) instrument
MiniFlex
New sixth generation MiniFlex X-ray diffractometer (XRD) is a multipurpose analytical instrument that can determine: phase identification and quantification, percent (%) crystallinity, crystallite size and strain, lattice parameter refinement, Rietveld refinement, and molecular structure. It is widely used in research, especially in material science and chemistry, as well as in industry for research and quality control. It is the newest addition to MiniFlex series of benchtop X-ray diffraction analyzers from Rigaku, which began with the introduction of the original MiniFlex system decades ago.
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Simultaneous Wavelength Dispersive X-ray Fluorescence Spectrometer
Simultix 15
Multi-channel simultaneous wavelength dispersive X-ray fluorescence (WDXRF) spectrometer system, the Simultix 15 high-throughput WDXRF spectrometer. Analyze beryllium (Be) through uranium (U) in almost any sample matrix. The most important metrics for automated process control are precision, accuracy and sample throughput. With up to 30 (and optionally 40) discrete and optimized elemental channels and 4 kW (or optionally 3 kW) of X-ray tube power, Simultix 15 delivers unparalleled analytical speed and sensitivity.
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Tube-Above Wavelength Dispersive X-ray Fluorescence Spectrometer
ZSX Primus IV
As a tube-above sequential wavelength dispersive X-ray fluorescence spectrometer, the new Rigaku ZSX Primus IV delivers rapid quantitative determination of major and minor atomic elements, from beryllium (Be) through uranium (U), in a wide variety of sample types — with minimal standards. ZSX Guidance supports you in all aspects of measurement and data analysis. Can accurate analysis only be performed by experts ? No — that is in the past. ZSX Guidance software, with the built-in XRF expertise and know-how of skilled experts, takes care of sophisticated settings. Operators simply input basic information about samples, analysis components and standard composition. Measured lines with the least overlap, optimum backgrounds and correction parameters (including line overlaps) are automatically set with aid of qualitative spectra.
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X-Ray Seamless Pixel Array Detector
XSPA-400 ER
In general, X-ray diffraction measurements using a Cu X-ray source are known to have difficulty detecting trace crystalline phases because of increased background when measuring samples containing transition metals. The high energy resolution of the XSPA-400 ER supresses the fluorescent X-rays originating from the sample, thereby reducing background, enabling highly sensitive measurements of samples containing transition metals, such as iron and steel compounds and battery materials.Therefore, it achieves higher sensitivity measurements than conventional detectors.
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High-power Benchtop Sequential WDXRF Spectrometer
Supermini200
Elemental analysis of solids, liquids, powders, alloys and thin films. The new Supermini200 has improved software capabilities as well as a better footprint. As the world''s only high-power benchtop sequential wavelength dispersive X-ray fluorescence (WDXRF) spectrometer for elemental analysis of oxygen (O) through uranium (U) of almost any material, the Rigaku Supermini200 uniquely delivers low cost-of-ownership (COO) with high resolution and lower limits-of-detection (LLD)..
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General Purpose Benchtop XRD System for Phase I.D. and Phase Quantification
In a move to bring lab-quality performance to the manufacturing floor, Rigaku introduces the MiniFlex XpC, a manufacturing-optimized powder diffractometer for fast and accurate quality control measurements. It is extremely easy to operate using Rigaku’s new EasyX quality control software, which requires minimal clicks to run. A minimal interface means there will be no accidental error variance from operator to operator. The MiniFlex XpC can be configured with a conveyor belt or robot for automated sample processing and collaboration with other instruments. With an 800 W X-ray source and a short-diameter goniometer, the system has the performance of a lab unit, and thus can greatly improve throughput for quality control measurements.
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Process XRR, XRF, and XRD metrology FAB tool
MFM310
Thickness, density, roughness & composition of films on blanket and patterned wafers. The Rigaku MFM310 performs high-precision measurements not possible by optical or ultrasonic techniques. This sophisticated X-ray metrology tool makes it practical to perform high-throughput measurements on product and blanket wafers ranging from ultrathin single-layer films to multilayer stacks.
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